Synchronous Pulse Plasma Operation upon Source and Bias Radio Frequencys for Inductively Coupled Plasma for Highly Reliable Gate Etching Technology
Tokashiki, Ken, Cho, Hong, Banna, Samer, Lee, Jeong-Yun, Shin, Kyoungsub, Todorow, Valentin, Kim, Woo-Seok, Bai, KeunHee, Joo, Sukho, Choe, Jeong-Dong, Ramaswamy, Kartik, Agarwal, Ankur, Rauf, Shahid, Collins, Ken, Choi, SangJun, Cho, Han, Kim, Hyun Joong, Lee, Changhun, Lymberopoulos, Dimitris, Yoon, Junho, Han, Woosung, Moon, Joo-Tae
Published in Japanese Journal of Applied Physics (01.08.2009)
Published in Japanese Journal of Applied Physics (01.08.2009)
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Journal Article
Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching
Banna, S., Agarwal, A., Tokashiki, K., Hong Cho, Rauf, S., Todorow, V., Ramaswamy, K., Collins, K., Stout, P., Jeong-Yun Lee, Junho Yoon, Kyoungsub Shin, Sang-Jun Choi, Han-Soo Cho, Hyun-Joong Kim, Changhun Lee, Lymberopoulos, D.
Published in IEEE transactions on plasma science (01.09.2009)
Published in IEEE transactions on plasma science (01.09.2009)
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Journal Article
Two-Dimensional Self-Consistent Radio Frequency Plasma Simulations Relevant to the Gaseous Electronics Conference RF Reference Cell
Lymberopoulos, Dimitris P, Economou, Demetre J
Published in Journal of research of the National Institute of Standards and Technology (01.07.1995)
Published in Journal of research of the National Institute of Standards and Technology (01.07.1995)
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Journal Article
Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching: Special Issue on Advances on Plasma Processing for Semiconductor Manufacturing
BANNA, Samer, AGARWAL, Ankur, JUNHO YOON, KYOUNGSUB SHIN, CHOI, Sang-Jun, CHO, Han-Soo, KIM, Hyun-Joong, CHANGHUN LEE, LYMBEROPOULOS, Dimitris, TOKASHIKI, Ken, HONG CHO, RAUF, Shahid, TODOROW, Valentin, RAMASWAMY, Kartik, COLLINS, Ken, STOUT, Phillip, LEE, Jeong-Yun
Published in IEEE transactions on plasma science (2009)
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Published in IEEE transactions on plasma science (2009)
Journal Article