Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene
Lukose, R., Lisker, M., Akhtar, F., Fraschke, M., Grabolla, T., Mai, A., Lukosius, M.
Published in Scientific reports (23.06.2021)
Published in Scientific reports (23.06.2021)
Get full text
Journal Article
Author Correction: Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene
Lukose, R., Lisker, M., Akhtar, F., Fraschke, M., Grabolla, T., Mai, A., Lukosius, M.
Published in Scientific reports (20.08.2021)
Published in Scientific reports (20.08.2021)
Get full text
Journal Article
High-Mobility Epitaxial Graphene on Ge/Si(100) Substrates
Aprojanz, J, Rosenzweig, Ph, Nguyen, T. T. Nhung, Karakachian, H, Küster, K, Starke, U, Lukosius, M, Lippert, G, Sinterhauf, A, Wenderoth, M, Zakharov, A. A, Tegenkamp, C
Published in ACS applied materials & interfaces (23.09.2020)
Published in ACS applied materials & interfaces (23.09.2020)
Get full text
Journal Article
Metal-Free CVD Graphene Synthesis on 200 mm Ge/Si(001) Substrates
Lukosius, M, Dabrowski, J, Kitzmann, J, Fursenko, O, Akhtar, F, Lisker, M, Lippert, G, Schulze, S, Yamamoto, Y, Schubert, M. A, Krause, H. M, Wolff, A, Mai, A, Schroeder, T, Lupina, G
Published in ACS applied materials & interfaces (14.12.2016)
Published in ACS applied materials & interfaces (14.12.2016)
Get full text
Journal Article
Optical properties and band gap characterization of high dielectric constant oxides
Fursenko, O., Bauer, J., Lupina, G., Dudek, P., Lukosius, M., Wenger, Ch, Zaumseil, P.
Published in Thin solid films (01.05.2012)
Published in Thin solid films (01.05.2012)
Get full text
Journal Article
Conference Proceeding
Reliable metal-graphene contact formation process flows in a CMOS-compatible environment
Elviretti, M, Lisker, M, Lukose, R, Lukosius, M, Akhtar, F, Mai, A
Published in Nanoscale advances (11.10.2022)
Published in Nanoscale advances (11.10.2022)
Get full text
Journal Article
High performance metal–insulator–metal capacitors with atomic vapor deposited HfO2 dielectrics
Lukosius, M., Walczyk, Ch, Fraschke, M., Wolansky, D., Richter, H., Wenger, Ch
Published in Thin solid films (31.05.2010)
Published in Thin solid films (31.05.2010)
Get full text
Journal Article
Resistive switching characteristics of CMOS embedded HfO2-based 1T1R cells
WALCZYK, D, WALCZYK, Ch, SCHROEDER, T, BERTAUD, T, SOWINSKA, M, LUKOSIUS, M, FRASCHKE, M, TILLACK, B, WENGER, Ch
Published in Microelectronic engineering (01.07.2011)
Published in Microelectronic engineering (01.07.2011)
Get full text
Conference Proceeding
Journal Article
Properties of atomic-vapor and atomic-layer deposited Sr, Ti, and Nb doped Ta2O5 Metal–Insulator–Metal capacitors
Lukosius, M., Kaynak, C. Baristiran, Kubotsch, S., Blomberg, T., Ruhl, G., Wenger, Ch
Published in Thin solid films (01.05.2012)
Published in Thin solid films (01.05.2012)
Get full text
Journal Article
Conference Proceeding
Processing and integration of graphene in a 200 mm wafer Si technology environment
Lisker, M., Lukosius, M., Fraschke, M., Kitzmann, J., Dabrowski, J., Fursenko, O., Kulse, P., Schulz, K., Krüger, A., Drews, J., Schulze, S., Wolansky, D., Schubert, A.M., Katzer, J., Stolarek, D., Costina, I., Wolff, A., Dziallas, G., Coccetti, F., Mai, A.
Published in Microelectronic engineering (15.01.2019)
Published in Microelectronic engineering (15.01.2019)
Get full text
Journal Article
Metal-organic chemical vapor deposition of high-k dielectric Ce–Al–O layers from various metal-organic precursors for metal–insulator–metal capacitor applications
Abrutis, A., Lukosius, M., Skapas, M., Stanionyte, S., Kubilius, V., Wenger, Ch, Zauner, A.
Published in Thin solid films (01.06.2013)
Published in Thin solid films (01.06.2013)
Get full text
Journal Article
The role of the HfO2―TiN interface in capacitance―voltage nonlinearity of Metal-Insulator-Metal capacitors
WENGER, Ch, LUKOSIUS, M, WEIDNER, G, MÜSSIG, H.-J, PASKO, S, LOHE, Ch
Published in Thin solid films (01.10.2009)
Published in Thin solid films (01.10.2009)
Get full text
Conference Proceeding
Journal Article
Textured strontium titanate layers on platinum by atomic layer deposition
Blomberg, T., Anttila, J., Haukka, S., Tuominen, M., Lukosius, M., Wenger, Ch, Saukkonen, T.
Published in Thin solid films (31.08.2012)
Published in Thin solid films (31.08.2012)
Get full text
Journal Article
Atomic Vapor Depositions of Ti–Ta–O thin films for Metal–Insulator–Metal applications
Lukosius, M., Kaynak, C. Baristiran, Wenger, Ch, Ruhl, G., Rushworth, S., Baumann, P.
Published in Thin solid films (31.03.2011)
Published in Thin solid films (31.03.2011)
Get full text
Journal Article
Basic investigation of HfO2 based metal–insulator–metal diodes
Dudek, P., Schmidt, R., Lukosius, M., Lupina, G., Wenger, Ch, Abrutis, A., Albert, M., Xu, K., Devi, A.
Published in Thin solid films (30.06.2011)
Published in Thin solid films (30.06.2011)
Get full text
Journal Article
Single SrTiO3 and Al2O3/SrTiO3/Al2O3 based MIM capacitors: Impact of the bottom electrode material
BARISTIRAN KAYNAK, C, LUKOSIUS, M, TILLACK, B, WENGER, Ch, BLOMBERG, T, RUHL, G
Published in Microelectronic engineering (01.07.2011)
Published in Microelectronic engineering (01.07.2011)
Get full text
Conference Proceeding
Journal Article
Enhanced leakage current behavior of Sr2Ta2O7-x/SrTiO3 bilayer dielectrics for metal-insulator-metal capacitors
BARISTIRAN KAYNAK, C, LUKOSIUS, M, COSTINA, I, TILLACK, B, WENGER, Ch, RUHL, G, BLOMBERG, T
Published in Thin solid films (30.06.2011)
Published in Thin solid films (30.06.2011)
Get full text
Conference Proceeding
Journal Article
Chemical vapour deposition of praseodymium oxide films on silicon: influence of temperature and oxygen pressure
Abrutis, A., Lukosius, M., Saltyte, Z., Galvelis, R., Baumann, P.K., Schumacher, M., Lindner, J.
Published in Thin solid films (02.06.2008)
Published in Thin solid films (02.06.2008)
Get full text
Journal Article
Investigation of atomic vapour deposited TiN/HfO2/SiO2 gate stacks for MOSFET devices
WENGER, Ch, LUKOSIUS, M, COSTINA, I, SORGE, R, DABROWSKI, J, MÜSSIG, H.-J, PASKO, S, LOHE, Ch
Published in Microelectronic engineering (01.08.2008)
Published in Microelectronic engineering (01.08.2008)
Get full text
Journal Article
Atomic Vapor Deposition of Strontium Tantalate Films for MIM Applications
Lukosius, M., Wenger, C., Pasko, S., Costina, I., Dabrowski, J., Sorge, R., Mussig, H.-J., Lohe, C.
Published in IEEE transactions on electron devices (01.08.2008)
Published in IEEE transactions on electron devices (01.08.2008)
Get full text
Journal Article