Surface charge control during high-current ion implantation: characterization with CHARM-2 sensors
Current, Michael I, Lukaszek, Wes, Vella, Michael C, Tripsas, Nicholas H
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.03.1995)
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.03.1995)
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Journal Article
MERLIN: a device diagnosis system based on analytic models
Freeman, G., Lukaszek, W., Pan, Y.Y.C.
Published in IEEE transactions on semiconductor manufacturing (01.11.1993)
Published in IEEE transactions on semiconductor manufacturing (01.11.1993)
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Journal Article
Test chip based approach to automated diagnosis of CMOS yield problems
Lukaszek, W., Grambow, K.G., Yarbrough, W.J.
Published in IEEE transactions on semiconductor manufacturing (01.02.1990)
Published in IEEE transactions on semiconductor manufacturing (01.02.1990)
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Journal Article
A new wafer surface charge monitor (CHARM)
McCarthy, A.M., Lukaszek, W.
Published in Proceedings of the 1989 International Conference on Microelectronic Test Structures (1989)
Published in Proceedings of the 1989 International Conference on Microelectronic Test Structures (1989)
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Conference Proceeding
Monitoring charging in high current ion implanters yields optimum preventive maintenance schedules and procedures
Gonzalez, H., Reno, S., Messick, C., Lukaszek, W., Romanski, T.
Published in 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) (1999)
Published in 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) (1999)
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Conference Proceeding
A novel technique for detecting lithographic defects
McCarthy, A.M., Lukaszek, W., Fu, C.C., Dameron, D.H., Meindl, J.D.
Published in IEEE transactions on semiconductor manufacturing (01.02.1988)
Published in IEEE transactions on semiconductor manufacturing (01.02.1988)
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Journal Article