Convection-assisted chemical vapor deposition (CoCVD) of silicon on large-area substrates
Kunz, T., Burkert, I., Auer, R., Lovtsus, A.A., Talalaev, R.A., Makarov, Yu.N.
Published in Journal of crystal growth (15.03.2008)
Published in Journal of crystal growth (15.03.2008)
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Journal Article
Kinetics of SiGe chemical vapor deposition from chloride precursors
Lovtsus, A.A., Segal, A.S., Sid’ko, A.P., Talalaev, R.A., Storck, P., Kadinski, L.
Published in Journal of crystal growth (25.01.2006)
Published in Journal of crystal growth (25.01.2006)
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Conference Proceeding
Effect of gas-phase nucleation on chemical vapor deposition of silicon carbide
Vorob'ev, A.N, Karpov, S.Yu, Zhmakin, A.I, Lovtsus, A.A, Makarov, Yu.N, Krishnan, A
Published in Journal of crystal growth (01.04.2000)
Published in Journal of crystal growth (01.04.2000)
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Journal Article
Modeling of gas phase nucleation during silicon carbide chemical vapor deposition
Vorob'ev, A.N., Karpov, S.Yu, Bord, O.V., Zhmakin, A.I., Lovtsus, A.A., Makarov, Yu.N.
Published in Diamond and related materials (01.04.2000)
Published in Diamond and related materials (01.04.2000)
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Journal Article