Microscopic model for the nonlinear behavior of high- k metal-insulator-metal capacitors
Wenger, Ch, Lupina, G., Lukosius, M., Seifarth, O., Müssig, H.-J., Pasko, S., Lohe, Ch
Published in Journal of applied physics (15.05.2008)
Published in Journal of applied physics (15.05.2008)
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Journal Article
The role of the HfO2―TiN interface in capacitance―voltage nonlinearity of Metal-Insulator-Metal capacitors
WENGER, Ch, LUKOSIUS, M, WEIDNER, G, MÜSSIG, H.-J, PASKO, S, LOHE, Ch
Published in Thin solid films (01.10.2009)
Published in Thin solid films (01.10.2009)
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Conference Proceeding
Journal Article
The role of the HfO(2)-TiN interface in capacitance-voltage nonlinearity of Metal-Insulator-Metal capacitors
Wenger, Ch, Lukosius, M, Weidner, G, Mussig, H J, Pasko, S, Lohe, Ch
Published in Thin solid films (01.10.2009)
Published in Thin solid films (01.10.2009)
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Journal Article
Investigation of atomic vapour deposited TiN/HfO2/SiO2 gate stacks for MOSFET devices
WENGER, Ch, LUKOSIUS, M, COSTINA, I, SORGE, R, DABROWSKI, J, MÜSSIG, H.-J, PASKO, S, LOHE, Ch
Published in Microelectronic engineering (01.08.2008)
Published in Microelectronic engineering (01.08.2008)
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Journal Article
Atomic -vapour -deposited HfO2 and Sr4Ta2O9 layers for metal-insulator-metal applications
LUKOSIUS, M, WENGER, Ch, SCHROEDER, T, DABROWSKI, J, SORGE, R, COSTINA, I, MÜSSIG, H.-J, PASKO, S, LOHE, Ch
Published in Microelectronic engineering (01.09.2007)
Published in Microelectronic engineering (01.09.2007)
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Conference Proceeding
Journal Article