EUV exposure apparatus with reflective elements having reduced influence of temperature variation
Stickel, Franz-Josef, Hauf, Markus, Baer, Norman, Laufer, Timo, Wittich, Gero, Van Schoot, Jan, Limbach, Guido, Kwan, Yim-Bun-Patrick, Loering, Ulrich, Natt, Oliver, Hembacher, Stefan, Kuerz, Peter, Walter, Holger
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Year of Publication 11.06.2019
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Year of Publication 01.03.2021
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Projection objective with diaphragms
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Year of Publication 16.07.2013
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Year of Publication 16.07.2013
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EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFLUENCE OF TEMPERATURE VARIATION
Stickel, Franz-Josef, Hauf, Markus, Baer, Norman, Laufer, Timo, Wittich, Gero, Van Schoot, Jan, Limbach, Guido, Kwan, Yim-Bun-Patrick, Loering, Ulrich, Natt, Oliver, Hembacher, Stefan, Kuerz, Peter, Walter, Holger
Year of Publication 18.10.2018
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Year of Publication 18.10.2018
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SURFACE CORRECTION OF MIRRORS WITH DECOUPLING COATING
STICKEL FRANZ-JOSEF, KAMENOV VLADIMIR, RENNON SIEGFRIED, LOERING ULRICH, MUELLER JUERGEN, HACKL TOBIAS, DIER OLIVER, ASSMUS TILMANN
Year of Publication 21.07.2016
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Year of Publication 21.07.2016
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EUV exposure apparatus with reflective elements having reduced influence of temperature variation
Stickel, Franz-Josef, Hauf, Markus, Baer, Norman, Laufer, Timo, Wittich, Gero, Van Schoot, Jan, Limbach, Guido, Kwan, Yim-Bun-Patrick, Loering, Ulrich, Natt, Oliver, Hembacher, Stefan, Kuerz, Peter, Walter, Holger
Year of Publication 24.07.2018
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Year of Publication 24.07.2018
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Projection objective with diaphragms
SORG, FRANZ, WOLF, ALEXANDER, LOERING, ULRICH, HOLLAND, CHRISTIAN, DIECKMANN, NILS
Year of Publication 01.08.2018
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Year of Publication 01.08.2018
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MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS
Sorg Franz, Kugler Jens, Loering Ulrich, Hoch Rainer, Gruner Toralf, Mallmann Joerg, Wabra Norbert, Ehrmann Albrecht, Schuster Karl-Heinz, Wegmann Ulrich, Kneer Bernhard, Geuppert Bernhard
Year of Publication 23.03.2017
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Year of Publication 23.03.2017
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Projection objective with diaphragms
SORG, FRANZ, WOLF, ALEXANDER, LOERING, ULRICH, HOLLAND, CHRISTIAN, DIECKMANN, NILS
Year of Publication 01.04.2018
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Year of Publication 01.04.2018
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Projection objective with diaphragms
SORG, FRANZ, WOLF, ALEXANDER, LOERING, ULRICH, HOLLAND, CHRISTIAN, DIECKMANN, NILS
Year of Publication 21.02.2018
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Year of Publication 21.02.2018
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EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFLUENCE OF TEMPERATURE VARIATION
Hembacher Stefan, Wittich Gero, Hauf Markus, Kuerz Peter, Kwan Yim-Bun-Patrick, Limbach Guido, Stickel Franz-Josef, Walter Holger, Baer Norman, Natt Oliver, Loering Ulrich, Laufer Timo, Van Schoot Jan
Year of Publication 02.11.2017
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Year of Publication 02.11.2017
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Exposure apparatus and measuring device for a projection lens
Sorg Franz, Kugler Jens, Loering Ulrich, Hoch Rainer, Gruner Toralf, Mallmann Joerg, Wabra Norbert, Ehrmann Albrecht, Schuster Karl-Heinz, Wegmann Ulrich, Kneer Bernhard, Geuppert Bernhard
Year of Publication 06.09.2016
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Year of Publication 06.09.2016
Patent
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
Hembacher Stefan, Wittich Gero, Hauf Markus, Kuerz Peter, Kwan Yim-Bun-Patrick, Limbach Guido, Stickel Franz-Josef, Walter Holger, Baer Norman, Natt Oliver, Loering Ulrich, Laufer Timo, Van Schoot Jan
Year of Publication 29.08.2017
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Year of Publication 29.08.2017
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LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME
ULRICH WILHELM, BLAHNIK VLADAN, KRAEHMER DANIEL, LOERING ULRICH, WABRA NORBERT
Year of Publication 26.01.2012
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Year of Publication 26.01.2012
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