Low interface trap density Al2O3/In0.53Ga0.47As MOS capacitor fabricated on MOCVD-grown InGaAs epitaxial layer on Si substrate
Lin, Yueh-Chin, Huang, Mao-Lin, Chen, Chen-Yu, Chen, Meng-Ku, Lin, Hung-Ta, Tsai, Pang-Yan, Lin, Chun-Hsiung, Chang, Hui-Cheng, Lee, Tze-Liang, Lo, Chia-Chiung, Jang, Syun-Ming, Diaz, Carlos H., Hwang, He-Yong, Sun, Yuan-Chen, Chang, Edward Yi
Published in Applied physics express (01.04.2014)
Published in Applied physics express (01.04.2014)
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Journal Article
Low interface trap density Al 2 O 3 /In 0.53 Ga 0.47 As MOS capacitor fabricated on MOCVD-grown InGaAs epitaxial layer on Si substrate
Lin, Yueh-Chin, Huang, Mao-Lin, Chen, Chen-Yu, Chen, Meng-Ku, Lin, Hung-Ta, Tsai, Pang-Yan, Lin, Chun-Hsiung, Chang, Hui-Cheng, Lee, Tze-Liang, Lo, Chia-Chiung, Jang, Syun-Ming, Diaz, Carlos H., Hwang, He-Yong, Sun, Yuan-Chen, Chang, Edward Yi
Published in Applied physics express (01.04.2014)
Published in Applied physics express (01.04.2014)
Get full text
Journal Article
Polisher, polishing tool, and polishing method
Lo, Chia-Chiung, Jeng, Shwang-Ming, Yeo, Yee-Chia, Lu, Yung-Cheng, Lee, Shen-Nan, Tsai, Teng-Chun
Year of Publication 04.12.2018
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Year of Publication 04.12.2018
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Air purge cleaning for semiconductor polishing apparatus
Lin Kuo-Yin, Tsai Teng-Chun, Chang Hsiang-Pi, Lo Cary Chia-Chiung, Wu Kun-Tai, Peng Chih-I
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Year of Publication 10.04.2018
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POLISHER, POLISHING TOOL, AND POLISHING METHOD
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Year of Publication 06.07.2017
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Year of Publication 06.07.2017
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Polisher, polishing tool, and polishing method
LU, YUNG CHENG, LO, CHIA CHIUNG, JENG, SHWANG MING, LEE, SHEN NAN, TSAI, TENG CHUN, YEO, YEEIA
Year of Publication 01.08.2021
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Year of Publication 01.08.2021
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Method for clean of oxide layer
LIN, KUO YIN, YEN, MING LIANG, WU, LI LAN, CHANG, HUICHENG, LIU, MING CHYI, TSAI, TENG CHUN, LIN, CHENG TUNG, PAN, WAN CHUN, LO, CARY CHIA CHIUNG, CHEN, CHI YUAN, WANG, LI TING
Year of Publication 21.05.2016
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Year of Publication 21.05.2016
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