Infrared study of the structure of silicon oxynitride films produced by plasma enhanced chemical vapor deposition
Lisovskyy, I.P., Voitovych, M.V., Sarikov, A.V., Zlobin, S.O., Lukianov, A.N., Oberemok, O.S., Dubikovsky, O.V.
Published in Journal of non-crystalline solids (01.10.2023)
Published in Journal of non-crystalline solids (01.10.2023)
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