Plasma Etch Challenges for Porous Low k Materials for 32nm and Beyond
Labelle, Catherine, Srivastava, Ravi, Arnold, John C., Yin, Yunpeng, Ishikawa, Masao, Mignot, Yann, Yusuff, Hakeem, Linville, Joseph, Horak, David, Fuller, Nicholas, Patz, Ryan, Darlak, A., Zhou, Kevin, Zhou, Yifeng, Pender, Jeremiah
Published in ECS transactions (01.01.2011)
Published in ECS transactions (01.01.2011)
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Journal Article
METHOD OF FABRICATING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
LINVILLE JOSEPH EDWARD, SRIVASTAVA RAVI PRAKASH, KUMAR KAUSHIK ARUN, LISI ANTHONY DAVID, PARK, WAN JAE, WENDT HERMANN WILLHELM
Year of Publication 31.03.2009
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Year of Publication 31.03.2009
Patent