Effect of Trimethylsilylation on the Film Stress of Mesoporous Silica Ultralow-k Film Stacks
Chen, Jr-Yu, Pan, Fu-Ming, Lin, Da-Xien, Cho, An-Thung, Chao, Kuei-Jung, Chang, Li
Published in Electrochemical and solid-state letters (01.01.2006)
Published in Electrochemical and solid-state letters (01.01.2006)
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