Scatterometry measurement for SiGe AEI sigma-shaped gate structures of 28nm technology
Yu-Wen Wang, Yeh, A., Pao-Chung Lin, Chin-Cheng Chien, Lin, C-H B., Xu, Z-Q J., Cheng, C-Y H., Sungchul Yoo, Lin, J., Mihardja, L., Perry-Sullivan, C.
Published in 2012 SEMI Advanced Semiconductor Manufacturing Conference (01.05.2012)
Published in 2012 SEMI Advanced Semiconductor Manufacturing Conference (01.05.2012)
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