플라즈마의 에칭 효과에 대한 보호를 위한 차폐부를 갖는 EUV 방사선용 광학 장치
HARTJES JOACHIM, HILD KERSTIN, HAAS SIMON, BECKER MORITZ, LIEBAUG BJOERN
Year of Publication 25.03.2020
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Year of Publication 25.03.2020
Patent
Optical arrangement for EUV radiation with a shield for protection against the etching effect of a plasma
Haas, Simon, Becker, Moritz, Liebaug, Bjoern, Hild, Kerstin, Hartjes, Joachim
Year of Publication 05.10.2021
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Year of Publication 05.10.2021
Patent
OPTICAL ARRANGEMENT FOR EUV RADIATION WITH A SHIELD FOR PROTECTION AGAINST THE ETCHING EFFECT OF A PLASMA
HILD, Kerstin, HARTJES, Joachim, HAAS, Simon, LIEBAUG, Bjoern, BECKER, Moritz
Year of Publication 28.05.2020
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Year of Publication 28.05.2020
Patent
OPTICAL ARRANGEMENT FOR EUV RADIATION WITH A SHIELD FOR PROTECTION AGAINST THE ETCHING EFFECT OF A PLASMA
LIEBAUG, Björn, HILD, Kerstin, HARTJES, Joachim, HAAS, Simon, BECKER, Moritz
Year of Publication 07.02.2019
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Year of Publication 07.02.2019
Patent
Optische Anordnung für EUV-Strahlung mit einer Abschirmung zum Schutz vor der Ätzwirkung eines Plasmas
Haas, Simon, Becker, Moritz, Liebaug, Björn, Hild, Kerstin, Hartjes, Joachim
Year of Publication 31.01.2019
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Year of Publication 31.01.2019
Patent