One-kilobit cross-bar molecular memory circuits at 30-nm half-pitch fabricated by nanoimprint lithography
Wu, W., Jung, G.-Y., Olynick, D.L., Straznicky, J., Li, Z., Li, X., Ohlberg, D.A.A., Chen, Y., Wang, S.-Y., Liddle, J.A., Tong, W.M., Williams, R. Stanley
Published in Applied physics. A, Materials science & processing (01.03.2005)
Published in Applied physics. A, Materials science & processing (01.03.2005)
Get full text
Journal Article
Staining Block Copolymers using Sequential Infiltration Synthesis for High Contrast Imaging and STEM tomography
Segal-Peretz, T., Winterstein, J., Biswas, M., Liddle, J.A., Elam, Jeffrey W., Zaluzec, N. J., Nealey, P.F.
Published in Microscopy and microanalysis (01.08.2015)
Published in Microscopy and microanalysis (01.08.2015)
Get full text
Journal Article
10-nm channel length pentacene transistors
Lee, J.B., Chang, P.C., Liddle, J.A., Subramanian, V.
Published in IEEE transactions on electron devices (01.08.2005)
Published in IEEE transactions on electron devices (01.08.2005)
Get full text
Journal Article
Nanoimaging with a compact extreme-ultraviolet laser
Vaschenko, G, Brizuela, F, Brewer, C, Grisham, M, Mancini, H, Menoni, C S, Marconi, M C, Rocca, J J, Chao, W, Liddle, J A, Anderson, E H, Attwood, D T, Vinogradov, A V, Artioukov, I A, Pershyn, Y P, Kondratenko, V V
Published in Optics letters (15.08.2005)
Published in Optics letters (15.08.2005)
Get more information
Journal Article
Integration of Scanning Probes and Ion Beams
Persaud, A, Park, S. J, Liddle, J. A, Schenkel, T, Bokor, J, Rangelow, I. W
Published in Nano letters (01.06.2005)
Published in Nano letters (01.06.2005)
Get full text
Journal Article
Morphological evolution of Ge islands on Au-patterned Si
Robinson, J.T., Liddle, J.A., Minor, A., Radmilovic, V., Dubon, O.D.
Published in Journal of crystal growth (25.01.2006)
Published in Journal of crystal growth (25.01.2006)
Get full text
Journal Article
Conference Proceeding
Strategies for integration of donor electron spin qubits in silicon
Schenkel, T., Liddle, J.A., Bokor, J., Persaud, A., Park, S.J., Shangkuan, J., Lo, C.C., Kwon, S., Lyon, S.A., Tyryshkin, A.M., Rangelow, I.W., Sarov, Y., Schneider, D.H., Ager, J., de Sousa, R.
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
Get full text
Journal Article
Conference Proceeding
Advancing the ion beam thin film planarization process for the smoothing of substrate particles
Mirkarimi, P.B., Spiller, E., Baker, S.L., Robinson, J.C., Stearns, D.G., Liddle, J.A., Salmassi, F., Liang, T., Stivers, A.R.
Published in Microelectronic engineering (01.04.2005)
Published in Microelectronic engineering (01.04.2005)
Get full text
Journal Article
Processing issues in top–down approaches to quantum computer development in silicon
Park, S.-J., Persaud, A., Liddle, J.A., Nilsson, J., Bokor, J., Schneider, D.H., Rangelow, I.W., Schenkel, T.
Published in Microelectronic engineering (01.06.2004)
Published in Microelectronic engineering (01.06.2004)
Get full text
Journal Article
Open questions in electronic sputtering of solids by slow highly charged ions with respect to applications in single ion implantation
Schenkel, T., Rangelow, I.W., Keller, R., Park, S.J., Nilsson, J., Persaud, A., Radmilovic, V.R., Grabiec, P., Schneider, D.H., Liddle, J.A., Bokor, J.
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.06.2004)
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.06.2004)
Get full text
Journal Article
Sub-38 nm resolution microscopy with a tabletop 13 nm wavelength laser
Brewer, C., Vaschenko, G., Brizuela, F., Wang, Y., Larotonda, M.A., Luther, B.M., Marconi, M.C., Rocca, J.J., Menoni, C.S., Chao, W., Liddle, J.A., Liu, Y., Anderson, E.H., Attwood, D.T.
Published in 2006 Conference on Lasers and Electro-Optics and 2006 Quantum Electronics and Laser Science Conference (01.05.2006)
Published in 2006 Conference on Lasers and Electro-Optics and 2006 Quantum Electronics and Laser Science Conference (01.05.2006)
Get full text
Conference Proceeding
Global space charge effect in SCALPEL
Mkrtchyan, M., Munro, E., Liddle, J.A., Stanton, S.T., Waskiewicz, W.K., Farrow, R.C., Katsap, V.
Published in Microelectronic engineering (01.06.2000)
Published in Microelectronic engineering (01.06.2000)
Get full text
Journal Article
Conference Proceeding
Marks for SCALPEL ® tool optics optimization
Farrow, R.C., Gallatin, G.M., Waskiewicz, W.K., Liddle, J.A., Kizilyalli, I., Kornblit, A., Biddick, C., Blakey, M., Klemens, F., Felker, J., Kraus, J., Mkrtchyan, M., Orphanos, P.A., Layadi, N., Merchant, S.
Published in Microelectronic engineering (01.06.2000)
Published in Microelectronic engineering (01.06.2000)
Get full text
Journal Article
Conference Proceeding
SCALPEL mask defect imaging analysis
Stanton, Stuart T., Alexander Liddle, J., Novembre, Anthony E., Mkrtchyan, Masis M.
Published in Microelectronic engineering (1999)
Published in Microelectronic engineering (1999)
Get full text
Journal Article
Conference Proceeding
Pattern processing results and characteristics for SCALPEL masks
Novembre, A.E., Blakey, M.I., Farrow, R.C., Kasica, R.J., Knurek, C.S., Liddle, J.A., Peabody, M.L.
Published in Microelectronic engineering (1999)
Published in Microelectronic engineering (1999)
Get full text
Journal Article
Conference Proceeding
Electron-optics method for high-throughput in a SCALPEL system: Preliminary analysis
Waskiewicz, W.K., Harriott, L.R., Liddle, J.A., Stanton, S.T., Berger, S.D., Munro, E., Zhu, X.
Published in Microelectronic engineering (01.03.1998)
Published in Microelectronic engineering (01.03.1998)
Get full text
Journal Article
Conference Proceeding
Optimization of a SCALPEL ® exposure tool using a diffractive image quality technique
Eichner, L., Blakey, M.I., Farrow, R.C., Liddle, J.A., Orphanos, P.A., Waskiewicz, W.K.
Published in Microelectronic engineering (1999)
Published in Microelectronic engineering (1999)
Get full text
Journal Article
Conference Proceeding
Space-charge limitations to throughput in projection electron-beam lithography (SCALPEL)
Liddle, J.A., Blakey, M.I., Knurek, C.S., Mkrtchyan, M.M., Novembre, A.E., Ocola, L., Saunders, T., Waskiewicz, W.K.
Published in Microelectronic engineering (01.03.1998)
Published in Microelectronic engineering (01.03.1998)
Get full text
Journal Article
Conference Proceeding