How Lithography and Metrology Are Enabling Yield in the Next Generation of Semiconductor Patterning
Neisser, Mark, Orji, Ndubuisi G., Levinson, Harry J., Celano, Umberto, Moyne, James, Mashiro, Supika, Wilcox, Dan, Libman, Slava
Published in Computer (Long Beach, Calif.) (01.01.2024)
Published in Computer (Long Beach, Calif.) (01.01.2024)
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Journal Article
Lithography
Neisser, Mark, Levinson, Harry J., Wurm, Stefan, Kyser, David, Watanabe, Takeo, Macwilliams, Ken, Ishiuchi, Hidemi, Trybula, Walt, Hayashi, Naoya, Fedynyshyn, Ted, Higgins, Craig, Nakamura, Tsuyoshi, Resnick, Doug, Preil, Moshe, Lercel, Michael, Aoyama, Hajime, Hosler, Erik
Published in 2021 IEEE International Roadmap for Devices and Systems Outbriefs (01.11.2021)
Published in 2021 IEEE International Roadmap for Devices and Systems Outbriefs (01.11.2021)
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Conference Proceeding