Reflow of supported sub-100 nm polymer films as a characterization process for NanoImprint lithography
Leveder, T., Rognin, E., Landis, S., Davoust, L.
Published in Microelectronic engineering (01.08.2011)
Published in Microelectronic engineering (01.08.2011)
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Journal Article
Optimization of demolding temperature for throughput improvement of nanoimprint lithography
Leveder, T., Landis, S., Davoust, L., Chaix, N.
Published in Microelectronic engineering (01.05.2007)
Published in Microelectronic engineering (01.05.2007)
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Journal Article
Conference Proceeding
Investigation of capillary bridges growth in NIL process
Landis, S., Chaix, N., Hermelin, D., Leveder, T., Gourgon, C.
Published in Microelectronic engineering (01.05.2007)
Published in Microelectronic engineering (01.05.2007)
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Journal Article
Conference Proceeding
Flow property measurements for nanoimprint simulation
Leveder, T., Landis, S., Davoust, L., Chaix, N.
Published in Microelectronic engineering (01.05.2007)
Published in Microelectronic engineering (01.05.2007)
Get full text
Journal Article
Conference Proceeding
Reflow of supported sub-100nm polymer films as a characterization process for NanoImprint lithography
Leveder, T., Rognin, E., Landis, S., Davoust, L.
Published in Microelectronic engineering (01.08.2011)
Published in Microelectronic engineering (01.08.2011)
Get full text
Journal Article