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Challenges in Nickel Platinum Silicide Wet Etching for Sub-65nm Device Technology
Goh, Felicia, Sih, Vincent K.T., Tan, Wee Leng, Ismail, Zainab
Published in Meeting abstracts (Electrochemical Society) (28.09.2007)
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Year of Publication 07.01.2014
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Year of Publication 25.04.2018
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Year of Publication 24.04.2018
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Year of Publication 31.07.2013
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Method to remove spacer after salicidation to enhance contact etch stop liner stress on MOS
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Year of Publication 16.08.2011
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Year of Publication 11.03.2010
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Year of Publication 29.01.2010
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WOH LAI CHUNG, CHOO HSIA LIANG, WENHE LIN, PENG KOH HUI, WAY TEH YOUNG, MENG LEE YONG, SUDIJONO JOHN, LENG TAN WEE, YONG LIM KHEE
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Year of Publication 29.12.2009
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Spacer-less low-k dielectric processes
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Year of Publication 10.11.2009
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Spacer-less low-k dielectric processes
LEE YONG MENG, LAI CHUNG WOH, SUDIJONO JOHN, HSIA LIANG CHOO, TEH YOUNG WAY, LIN WENHE, TAN WEE LENG, LIM KHEE YONG, KOH HUI PENG
Year of Publication 10.11.2009
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Year of Publication 10.11.2009
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METHOD TO REMOVE SPACER AFTER SALICIDATION TO ENHANCE CONTACT ETCH STOP LINER STRESS ON MOS
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Year of Publication 29.01.2009
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WOH LAI CHUNG, CHOO HSIA LIANG, WENHE LIN, PENG KOH HUI, WAY TEH YOUNG, MENG LEE YONG, SUDIJONO JOHN, LENG TAN WEE, YONG LIM KHEE
Year of Publication 29.01.2009
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Year of Publication 29.01.2009
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