Chemical Vapor Deposition of Cerium Oxide Films from a Cerium Alkoxide Precursor
Suh, Seigi, Guan, Jun, Mîinea, Liliana A, Lehn, Jean-Sébastien M, Hoffman, David M
Published in Chemistry of materials (04.05.2004)
Published in Chemistry of materials (04.05.2004)
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Journal Article
Chemical Vapor Deposition of Cobalt Nitride and its Application as an Adhesion-Enhancing Layer for Advanced Copper Interconnects
Bhandari, Harish B., Yang, Jing, Kim, Hoon, Lin, Youbo, Gordon, Roy G., Wang, Qing Min, Lehn, Jean-Sébastien M., Li, Huazhi, Shenai, Deo
Published in ECS journal of solid state science and technology (01.01.2012)
Published in ECS journal of solid state science and technology (01.01.2012)
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Journal Article
Syntheses and X-ray structures of cerium amide complexes
Daniel, Sherrika D., Lehn, Jean-Sébastien M., Korp, James D., Hoffman, David M.
Published in Polyhedron (23.01.2006)
Published in Polyhedron (23.01.2006)
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Journal Article
A new precursor for the chemical vapor deposition of tantalum nitride films
LEHN, Jean-Sébastien M, VAN DER HEIDE, Paul, YONGQIANG WANG, SUH, Seigi, HOFFMAN, David M
Published in Journal of materials chemistry (07.11.2004)
Published in Journal of materials chemistry (07.11.2004)
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Journal Article
INHERENTLY FERROELECTRIC HF-ZR CONTAINING FILMS
LEHN, Jean-Sébastien M, WOODRUFF, Jacob, LITTAU, Karl, KANJOLIA, Ravindra, NARASIMHAN, Vijay Kris
Year of Publication 26.04.2023
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Year of Publication 26.04.2023
Patent
RUTHENIUM PYRAZOLATE PRECURSOR FOR ATOMIC LAYER DEPOSITION AND SIMILAR PROCESSES
LEHN, Jean-Sébastien M, WOODRUFF, Jacob, COYLE, Jason P, DEZELAH, Charles, LIU, Guo
Year of Publication 27.10.2022
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Year of Publication 27.10.2022
Patent
RUTHENIUM PYRAZOLATE PRECURSOR FOR ATOMIC LAYER DEPOSITION AND SIMILAR PROCESSES
LEHN, Jean-Sébastien M, WOODRUFF, Jacob, COYLE, Jason P, DEZELAH, Charles, LIU, Guo
Year of Publication 05.10.2022
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Year of Publication 05.10.2022
Patent
INHERENTLY FERROELECTRIC HF-ZR CONTAINING FILMS
LEHN, Jean-Sébastien M, WOODRUFF, Jacob, LITTAU, Karl, KANJOLIA, Ravindra, NARASIMHAN, Vijay Kris
Year of Publication 23.12.2021
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Year of Publication 23.12.2021
Patent
RUTHENIUM PYRAZOLATE PRECURSOR FOR ATOMIC LAYER DEPOSITION AND SIMILAR PROCESSES
LEHN, Jean-Sébastien M, WOODRUFF, Jacob, COYLE, Jason P, DEZELAH, Charles, LIU, Guo
Year of Publication 03.06.2021
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Year of Publication 03.06.2021
Patent
본질적으로 강유전성인 HF-ZR을 포함하는 막
WOODRUFF JACOB, LEHN JEAN SEBASTIEN M, NARASIMHAN VIJAY KRIS, LITTAU KARL, KANJOLIA RAVINDRA
Year of Publication 28.02.2023
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Year of Publication 28.02.2023
Patent
원자층 증착 및 유사 공정을 위한 루테늄 피라졸레이트 전구체
WOODRUFF JACOB, LEHN JEAN SEBASTIEN M, LIU GUO, COYLE JASON P, DEZELAH CHARLES
Year of Publication 26.07.2022
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Year of Publication 26.07.2022
Patent
Film comprising Hf-Zr with intrinsic ferroelectricity
NARASIMHAN VINOD KUMAR, LEHN JEAN-SEBASTIEN M, RITTAU KATARINA, WOODRUFF JOHN, KANJOLIA, RAVI
Year of Publication 23.12.2022
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Year of Publication 23.12.2022
Patent