Low Dielectric Constant 3MS α-SiC:H as Cu Diffusion Barrier Layer in Cu Dual Damascene Process
Lee, Soo Geun, Kim, Yun Jun, Lee, Seung Pae, Oh, Hyeok-Sang, Lee, Seung Jae, Kim, Min, Kim, Il-Goo, Kim, Jae-Hak, Shin, Hong-Jae, Hong, Jin-Gi, Lee, Hyeon-Deok, Kang, Ho-Kyu
Published in Japanese Journal of Applied Physics (2001)
Published in Japanese Journal of Applied Physics (2001)
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