Low leakage, ultra-thin gate oxides for extremely high performance sub-100 nm nMOSFETs
Timp, G., Agarwal, A., Baumann, F.H., Boone, T., Buonanno, M., Cirelli, R., Donnelly, V., Foad, M., Grant, D., Green, M., Gossmann, H., Hillenius, S., Jackson, J., Jacobson, D., Kleiman, R., Komblit, A., Klemens, F., Lee, J.T.-C., Mansfield, W., Moccio, S., Murrell, A., O'Malley, M., Rosamilia, J., Sapjeta, J., Silverman, P., Sorsch, T., Tai, W.W., Tennant, D., Vuong, H., Weir, B.
Published in International Electron Devices Meeting. IEDM Technical Digest (1997)
Published in International Electron Devices Meeting. IEDM Technical Digest (1997)
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Conference Proceeding
50 nm Vertical Replacement-Gate (VRG) pMOSFETs
Sang-Hyun Oh, Hergenrother, J.M., Nigam, T., Monroe, D., Klemens, F.P., Kornblit, A., Mansfield, W.M., Baker, M.R., Barr, D.L., Baumann, F.H., Bolan, K.J., Boone, T., Ciampa, N.A., Cirelli, R.A., Eaglesham, D.J., Ferry, E.J., Fiory, A.T., Frackoviak, J., Garno, J.P., Gossmann, H.J., Grazul, J.L., Green, M.L., Hillenius, S.J., Johnson, R.W., Keller, R.C., King, C.A., Kleiman, R.N., Lee, J.T.-C., Miner, J.F., Morris, M.D., Rafferty, C.S., Rosamilia, J.M., Short, K., Sorsch, T.W., Timko, A.G., Weber, G.R., Wilk, G.D., Plummer, J.D.
Published in International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138) (2000)
Published in International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138) (2000)
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SALVO process for sub-50 nm low-V/sub T/ replacement gate CMOS with KrF lithography
Chang, C.-P., Vuang, H.-H., Baker, M.R., Pai, C.S., Klemens, F.P., Miner, J.F., Mansfield, W.M., Kleiman, R.N., Kornbllit, A., Baumann, F.H., Rogers, S.N., Bude, M., Grazul, J.L., Lloyd, E.J., Frei, M., Sorsch, T.W., Cirelli, R., Ferry, E., Bolan, K., Barr, D., Lee, J.T.-C.
Published in International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138) (2000)
Published in International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138) (2000)
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50 nm vertical replacement-gate (VRG) nMOSFETs with ALD HfO/sub 2/ and Al/sub 2/O/sub 3/ gate dielectrics
Hergenrother, J.M., Wilk, G.D., Nigam, T., Klemens, F.P., Monroe, D., Silverman, P.J., Sorsch, T.W., Busch, B., Green, M.L., Baker, M.R., Boone, T., Bude, M.K., Ciampa, N.A., Ferry, E.J., Fiory, A.T., Hillenius, S.J., Jacobson, D.C., Johnson, R.W., Kalavade, P., Keller, R.C., King, C.A., Kornblit, A., Krautter, H.W., Lee, J.T.-C., Mansfield, W.M., Miner, J.F., Morris, M.D., Oh, S.-H., Rosamilia, J.M., Sapjeta, B.J., Short, K., Steiner, K., Muller, D.A., Voyles, P.M., Grazul, J.L., Shero, E.J., Givens, M.E., Pomarede, C., Mazanec, M., Werkhoven, C.
Published in International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224) (2001)
Published in International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224) (2001)
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The Vertical Replacement-Gate (VRG) MOSFET: a 50-nm vertical MOSFET with lithography-independent gate length
Hergenrother, J.M., Monroe, D., Klemens, F.P., Komblit, A., Weber, G.R., Mansfield, W.M., Baker, M.R., Baumann, F.H., Bolan, K.J., Bower, J.E., Ciampa, N.A., Cirelli, R.A., Colonell, J.I., Eaglesham, D.J., Frackoviak, J., Gossmann, H.J., Green, M.L., Hillenius, S.J., King, C.A., Kleiman, R.N., Lai, W.Y.C., Lee, J.T.-C., Liu, R.C., Maynard, H.L., Morris, M.D., Oh, S.-H., Pai, C.-S., Rafferty, C.S., Rosamilia, J.M., Sorsch, T.W., Vuong, H.-H.
Published in International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318) (1999)
Published in International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318) (1999)
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Buried ultra-low-energy gate implants for sub-0.25 micron CMOS technology
Bevk, J., Kuehne, S., Vaidya, H., Mansfield, W., Hobler, G., Boulin, D.M., Bolan, K., Chang, C.P., Cheung, K.P., Cirelli, R., Colonell, J.I., Frackoviak, J., Frei, M., Gruensfelder, C., Jacobson, D.C., Key, R.W., Klemens, F.P., Lai, W.Y.C., Lee, J.T.-C., Liu, C.T., Liu, R., Oh, M., Maynard, H.L., Monroe, D.P., Nalamasu, O., Pai, C.S., Santiesteban, R., Silverman, P.J., Tai, W.W., Timko, A., Vuong, H., Watson, G.P., Thoma, M.J., Clemens, J.T., Hillenius, S.J.
Published in 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) (1998)
Published in 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) (1998)
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