Patterning of 25 nm Contact Holes at 90 nm Pitch: Combination of Line/Space Double Exposure Immersion Lithography and Plasma-Assisted Shrink Technology
Marneffe, Jean-Fran\{c}ois de, Lazzarino, Frédéric, Goossens, Danny, Vandervorst, Alain, Richard, Olivier, Shamiryan, Denis, Xu, Kaidong, Truffert, Vincent, Boullart, Werner
Published in Japanese Journal of Applied Physics (01.08.2011)
Published in Japanese Journal of Applied Physics (01.08.2011)
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Journal Article
Patterning of 25 nm Contact Holes at 90 nm Pitch: Combination of Line/Space Double Exposure Immersion Lithography and Plasma-Assisted Shrink Technology
Marneffe, Jean-François de, Lazzarino, Frédéric, Goossens, Danny, Vandervorst, Alain, Richard, Olivier, Shamiryan, Denis, Xu, Kaidong, Truffert, Vincent, Boullart, Werner
Published in Japanese Journal of Applied Physics (01.08.2011)
Published in Japanese Journal of Applied Physics (01.08.2011)
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Journal Article
Metal Containing Resist Readiness for HVM EUV Lithography
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Published in Journal of Photopolymer Science and Technology (01.01.2016)
Published in Journal of Photopolymer Science and Technology (01.01.2016)
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Milenin, Alexey P., Chan, BT, Lazzarino, Frederic
Published in Japanese Journal of Applied Physics (01.07.2023)
Published in Japanese Journal of Applied Physics (01.07.2023)
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Buried Power Rail Integration With FinFETs for Ultimate CMOS Scaling
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Published in IEEE transactions on electron devices (01.12.2020)
Published in IEEE transactions on electron devices (01.12.2020)
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Fabrication and room temperature characterization of trilayer junctions for the development of superconducting qubits on 300 mm wafers
Wan, Danny, Couet, Sebastian, Piao, Xiaoyu, Souriau, Laurent, Canvel, Yann, Tsvetanova, Diana, Vangoidsenhoven, Diziana, Thiam, Arame, Pacco, Antoine, Potočnik, Anton, Mongillo, Massimo, Ivanov, Tsvetan, Jussot, Julien, Verjauw, Jeroen, Acharya, Rohith, Lazzarino, Frederic, Govoreanu, Bogdan, Radu, Iuliana P.
Published in Japanese Journal of Applied Physics (01.05.2021)
Published in Japanese Journal of Applied Physics (01.05.2021)
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Modification of Ultra Low-k Dielectric Films by O 2 and CO 2 Plasmas
Olawumi, Teju Tunde, Levrau, Elisabeth, Krishtab, Mikhail, Detavernier, Christophe, Bartha, Johann W., Xu, Kaidong, Lazzarino, Frederic, Baklanov, Mikhail R.
Published in ECS journal of solid state science and technology (2015)
Published in ECS journal of solid state science and technology (2015)
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Journal Article
Modification of Ultra Low-k Dielectric Films by O2 and CO2 Plasmas
Olawumi, Teju Tunde, Levrau, Elisabeth, Krishtab, Mikhail, Detavernier, Christophe, Bartha, Johann W., Xu, Kaidong, Lazzarino, Frederic, Baklanov, Mikhail R.
Published in ECS journal of solid state science and technology (18.10.2014)
Published in ECS journal of solid state science and technology (18.10.2014)
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