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Deposition of Thin Films of Gallium Sulfide from a Novel Liquid Single-Source Precursor, Ga(SOCNEt2)3, by Aerosol-Assisted CVD
by
Horley, G. A.
,
Lazell
,
M
.
R
.
,
O'Brien, P.
Published in
Chemical vapor deposition
(01.10.1999)
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Deposition of Thin Films of Gallium Sulfide from a Novel Single-Source Precursor, Ga(S2CNMeHex)3, by Low-Pressure Metal−Organic Chemical Vapor Deposition
by
Lazell, Mike R
,
O'Brien, Paul
,
Otway, David J
,
Park, Jin-Ho
Published in
Chemistry of materials
(20.12.1999)
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chemistry
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engineering
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physics
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chemical vapor deposition
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cross-disciplinary physics: materials science; rheology
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exact sciences and technology
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materials science
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methods of deposition of films and coatings; film growth and epitaxy
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physics
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English
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American Chemical Society Journals
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