Damage-Free Cryogenic Aerosol Clean Processes
Hong Lin, Chioujones, K., Lauerhaas, J., Freebern, T., Yu, C.
Published in IEEE transactions on semiconductor manufacturing (01.05.2007)
Published in IEEE transactions on semiconductor manufacturing (01.05.2007)
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Journal Article
Formation of filled carbon nanotubes and nanoparticles using polycyclic aromatic hydrocarbon molecules
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Journal Article
Conference Proceeding
Formation of graphite encapsulated ferromagnetic particles and a mechanism for their growth
Setlur, A. A., Dai, J. Y., Lauerhaas, J. M., Washington, P. L., Chang, R. P. H.
Published in Journal of materials research (01.08.1998)
Published in Journal of materials research (01.08.1998)
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Journal Article
Reversible luminescence quenching of porous Si by solvents
LAUERHAAS, J. M, CREDO, G. M, HEINRICH, J. L, SAILOR, M. J
Published in Journal of the American Chemical Society (26.02.1992)
Published in Journal of the American Chemical Society (26.02.1992)
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Journal Article
Synthesis of carbon-encapsulated nanowires using polycyclic aromatic hydrocarbon precursors
Dai, J.Y., Lauerhaas, J.M., Setlur, A.A., Chang, R.P.H.
Published in Chemical physics letters (23.08.1996)
Published in Chemical physics letters (23.08.1996)
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Journal Article
The effect of arc parameters on the growth of carbon nanotubes
Lauerhaas, J. M., Dai, J. Y., Setlur, A. A., Chang, R. P. H.
Published in Journal of materials research (01.06.1997)
Published in Journal of materials research (01.06.1997)
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Journal Article
Single wafer cleaning and drying: particle removal via a non-contact, non-damaging megasonic clean followed by a high performance "Rotagoni" dry
Lauerhaas, J., Mertens, P.W., Fyen, W., Kenis, K., Meuris, M., Nicolosi, T., Bran, M., Fraser, B., Franklin, C., Wu, Y., Heyns, M.
Published in Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) (2000)
Published in Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) (2000)
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Conference Proceeding
A high performance drying method enabling clustered single wafer wet cleaning
Mertens, P.W., Doumen, G., Lauerhaas, J., Kenis, K., Fyen, W., Meuris, M., Arnauts, S., Devriendt, K., Vos, R., Heyns, M.
Published in 2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104) (2000)
Published in 2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104) (2000)
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Conference Proceeding
Damage-Free Cryogenic Aerosol Clean Processes
Hong Lin, Chioujones, K., Freebern, T., Chienfan Yu, Lauerhaas, J.
Published in The 17th Annual SEMI/IEEE ASMC 2006 Conference (2006)
Published in The 17th Annual SEMI/IEEE ASMC 2006 Conference (2006)
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Conference Proceeding
Critical issues in post Cu CMP cleaning
Fyen, W., Vos, R., Teerlinck, I., Lagrange, S., Lauerhaas, J., Meuris, M., Mertens, P., Heyns, M.
Published in Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) (2000)
Published in Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) (2000)
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Conference Proceeding