Etching of Silicon Native Oxide Using Ultraslow Multicharged Ar[sup q+] Ions
Le Roux, V., Machicoane, G., Kerdiles, S., Laffitte, R., Béchu, N., Vallier, L., Borsoni, G., Korwin-Pawlowski, M. L., Roman, P., Wu, C.-T., Ruzyllo, J.
Published in Journal of the Electrochemical Society (2004)
Published in Journal of the Electrochemical Society (2004)
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Journal Article
Ultrathin SiO2 layers formation by ultraslow single- and multicharged ions
Borsoni, G, Le Roux, V, Laffitte, R, Kerdilès, S, Béchu, N, Vallier, L, Korwin-Pawlowski, M.L, Vannuffel, C, Bertin, F, Vergnaud, C, Chabli, A, Wyon, C
Published in Solid-state electronics (01.11.2002)
Published in Solid-state electronics (01.11.2002)
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Journal Article
Ultra-thin oxides on silicon fabricated using ultra-slow multicharged ion beams
Borsoni, G., Béchu, N., Gros-Jean, M., Korwin-Pawlowski, M.L., Laffitte, R., Le Roux, V., Vallier, L., Rochat, N., Wyon, C.
Published in Microelectronics and reliability (01.07.2001)
Published in Microelectronics and reliability (01.07.2001)
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Journal Article
Etching of silicon native oxide using ultraslow multicharged Arq+ ions
LE ROUX, V, MACHICOANE, G, RUZYLLO, J, KERDILES, S, LAFFITTE, R, BECHU, N, VALLIER, L, BORSONI, G, KORWIN-PAWLOWSKI, M. L, ROMAN, P, WU, C.-T
Published in Journal of the Electrochemical Society (2004)
Published in Journal of the Electrochemical Society (2004)
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Journal Article
Ultrathin SiO sub 2 layers formation by ultraslow single- and multicharged ions
Borsoni, G, Le Roux, V, Laffitte, R, Kerdiles, S, Bechu, N, Vallier, L, Korwin-Pawlowski, M L, Vannuffel, C, Bertin, F, Vergnaud, C, Chabli, A, Wyon, C
Published in Solid-state electronics (01.11.2002)
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Published in Solid-state electronics (01.11.2002)
Journal Article
Ultrathin SiO 2 layers formation by ultraslow single- and multicharged ions
Borsoni, G, Le Roux, V, Laffitte, R, Kerdilès, S, Béchu, N, Vallier, L, Korwin-Pawlowski, M.L, Vannuffel, C, Bertin, F, Vergnaud, C, Chabli, A, Wyon, C
Published in Solid-state electronics (2002)
Published in Solid-state electronics (2002)
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Journal Article
Dependence of ultra-thin SiO sub(2) layers formation by ultra-slow single and multicharged ions on process conditions
Borsoni, G, Le Roux, V, Laffitte, R, Kerdiles, S, Bechu, N, Vallier, L, Korwin-Pawlowski, M L, Vannuffel, C, Bertin, F, Vergnaud, C, Chabli, A, Wyon, C
Published in Microelectronic engineering (01.11.2001)
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Published in Microelectronic engineering (01.11.2001)
Journal Article
Dependence of ultra-thin SiO 2 layers formation by ultra-slow single and multicharged ions on process conditions
Borsoni, G, Le Roux, V, Laffitte, R, Kerdilès, S, Béchu, N, Vallier, L, Korwin-Pawlowski, M.L, Vannuffel, C, Bertin, F, Vergnaud, C, Chabli, A, Wyon, C
Published in Microelectronic engineering (2001)
Published in Microelectronic engineering (2001)
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1,3,4-Oxadiazol-2(3H)-one-Derivate, ihre Herstellung und ihre Verwendung als Monoaminoxidase-Hemmer
KOENIG, JEAN-JACQUES, F-78600 MAISONS LAFFITTE, FR, JEGHAM, SAMIR, F-95100 ARGENTEUIL, FR, BURNIER, PHILIPPE, F-78600 MAISONS LAFFITTE, FR, PUECH, FREDERIC, F-92500 RUEIL MALMAISON, FR
Year of Publication 29.01.1998
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Year of Publication 29.01.1998
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Process for detection of rotating stall
LAFFITTE; DENIS R. G, DENEUX; PIERRE E, FAURE; PATRICK J, LEMAOULT; MICHEL E. M
Year of Publication 14.02.1984
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Year of Publication 14.02.1984
Patent