MEGASONIC IMMERSION LITHOGRAPHY EXPOSURE APPARATUS AND METHOD
LIN CHIN HSIANG, CHANG CHING YU, LIN BURN JENG, LIN CHIEN HUNG, LU DING CHUNG
Year of Publication 23.05.2007
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Year of Publication 23.05.2007
Patent
DISPOSITIF ET PROCEDE D'EXPOSITION DE LITHOGRAPHIE PAR IMMERSION MEGASONIQUE
LIN CHIN HSIANG, CHANG CHING YU, LIN BURN JENG, LIN CHIEN HUNG, LU DING CHUNG
Year of Publication 29.05.2009
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Year of Publication 29.05.2009
Patent
Megasonic immersion lithography exposure device for forming integrated circuit pattern, has chamber for containing exposure liquid, and megasonic plate engaging inlet conduit for propagating sonic waves through exposure liquid
LIN CHIN HSIANG, CHANG CHING YU, LIN BURN JENG, LIN CHIEN HUNG, LU DING CHUNG
Year of Publication 25.05.2007
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Year of Publication 25.05.2007
Patent