Thermal chemical vapor deposition system and operating method thereof
JUI-FU HSU, JHENG-UEI HSIEH, DING-I LIU, PO-HSIUNG LEU, SHIAN-HUEI LIN, CHENG-TSUNG WU, YENAN LO, YI-FANG LAI, KAI-SHIUNG HSU, SI-WEN LIAO
Year of Publication 04.07.2017
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Year of Publication 04.07.2017
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Processing devices
KOAI, KUANG-KUO, LEU, PO-HSIUNG, LO, YENAN, SUN, CHIN-FENG, CHEN, HUANIEH, LAI, YI-FANG, LIU, DING-I, HSU, KAI-SHIUNG
Year of Publication 16.03.2019
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Year of Publication 16.03.2019
Patent
Processing apparatus
LIU DING-I, CHEN HUANIEH, HSU KAI-SHIUNG, SUN CHIN-FENG, KOAI KEITH KUANG-KUO, LEU PO-HSIUNG, LO YENAN, LAI YI-FANG
Year of Publication 05.02.2019
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Year of Publication 05.02.2019
Patent
Thermal chemical vapor deposition system and operating method thereof
LIN, SHIAN-HUEI, WU, CHENG-TSUNG, LEU, PO-HSIUNG, HSU, JUI-FU, HSIEH, JHENG-UEI, LIAO, SI-WEN, LO, YENAN, LAI, YI-FANG, LIU, DING-I, HSU, KAI-SHIUNG
Year of Publication 16.05.2017
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Year of Publication 16.05.2017
Patent