Image reversal of diazo-novolak resist by concurrent bake promoted and photoacid catalyzed esterifications
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Journal Article
Conference Proceeding
Postexposure delay effect on linewidth variation in base added chemically amplified resist
KU, Chin-Yu, SHIEH, Jia-Min, CHIOU, Tsann-Bim, LIN, Hwang-Kuen, TAN FU LEI
Published in Journal of the Electrochemical Society (01.10.2000)
Published in Journal of the Electrochemical Society (01.10.2000)
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Journal Article