Overview of atomic layer etching in the semiconductor industry
Kanarik, Keren J., Lill, Thorsten, Hudson, Eric A., Sriraman, Saravanapriyan, Tan, Samantha, Marks, Jeffrey, Vahedi, Vahid, Gottscho, Richard A.
Published in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (01.03.2015)
Published in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (01.03.2015)
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Book Review
Predicting synergy in atomic layer etching
Kanarik, Keren J., Tan, Samantha, Yang, Wenbing, Kim, Taeseung, Lill, Thorsten, Kabansky, Alexander, Hudson, Eric A., Ohba, Tomihito, Nojiri, Kazuo, Yu, Jengyi, Wise, Rich, Berry, Ivan L., Pan, Yang, Marks, Jeffrey, Gottscho, Richard A.
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01.09.2017)
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01.09.2017)
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Journal Article
Ion Beam Patterning of High-Density STT-RAM Devices
Ip, Vincent, Shuogang Huang, Carnevale, Santino D., Berry, Ivan L., Rook, Katrina, Lill, Thorsten B., Paranjpe, Ajit P., Cerio, Frank
Published in IEEE transactions on magnetics (01.02.2017)
Published in IEEE transactions on magnetics (01.02.2017)
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Journal Article
Highly Selective Directional Atomic Layer Etching of Silicon
Tan, Samantha, Yang, Wenbing, Kanarik, Keren J., Lill, Thorsten, Vahedi, Vahid, Marks, Jeff, Gottscho, Richard A.
Published in ECS journal of solid state science and technology (01.01.2015)
Published in ECS journal of solid state science and technology (01.01.2015)
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Journal Article
Volatile Products from Ligand Addition of P(CH 3 ) 3 to NiCl 2 , PdCl 2 , and PtCl 2 : Pathway for Metal Thermal Atomic Layer Etching
Lii-Rosales, Ann, Johnson, Virginia L., Sharma, Sandeep, Fischer, Andreas, Lill, Thorsten, George, Steven M.
Published in Journal of physical chemistry. C (19.05.2022)
Published in Journal of physical chemistry. C (19.05.2022)
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Journal Article
Effectiveness of Different Ligands on Silane Precursors for Ligand Exchange to Etch Metal Fluorides
Lii-Rosales, Ann, Johnson, Virginia L., Cavanagh, Andrew S., Fischer, Andreas, Lill, Thorsten, Sharma, Sandeep, George, Steven M.
Published in Chemistry of materials (11.10.2022)
Published in Chemistry of materials (11.10.2022)
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Journal Article
Thermal Atomic Layer Etching of CoO, ZnO, Fe2O3, and NiO by Chlorination and Ligand Addition Using SO2Cl2 and Tetramethylethylenediamine
Partridge, Jonathan L., Murdzek, Jessica A., Johnson, Virginia L., Cavanagh, Andrew S., Fischer, Andreas, Lill, Thorsten, Sharma, Sandeep, George, Steven M.
Published in Chemistry of materials (14.03.2023)
Published in Chemistry of materials (14.03.2023)
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Journal Article
Thermal Atomic Layer Etching of CoO, ZnO, Fe 2 O 3 , and NiO by Chlorination and Ligand Addition Using SO 2 Cl 2 and Tetramethylethylenediamine
Partridge, Jonathan L., Murdzek, Jessica A., Johnson, Virginia L., Cavanagh, Andrew S., Fischer, Andreas, Lill, Thorsten, Sharma, Sandeep, George, Steven M.
Published in Chemistry of materials (14.03.2023)
Published in Chemistry of materials (14.03.2023)
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Journal Article
Progress report on high aspect ratio patterning for memory devices
Shen, Meihua, Lill, Thorsten, Hoang, John, Chi, Hao, Routzahn, Aaron, Church, Jonathan, Subramonium, Pramod, Puthenkovilakam, Ragesh, Reddy, Sirish, Bhadauriya, Sonal, Roberts, Sloan, Kamarthy, Gowri
Published in Japanese Journal of Applied Physics (01.07.2023)
Published in Japanese Journal of Applied Physics (01.07.2023)
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Journal Article