EINRICHTUNG ZUR STATIONAEREN BESCHICHTUNG EBENER SUBSTRATE IM HOCHVAKUUM
SCHILLER,SIEGFRIED,DE, HOLFELD,ANDREAS,DE, KORNDOERFER,CHRISTIAN,DE, HEISIG,ULLRICH,DE, LIEBERGELD,HORST,DE
Year of Publication 01.08.1991
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Year of Publication 01.08.1991
Patent
Vacuum chamber for electron beam working elongated workpieces - with side opening into which the part of the workpiece to be worked is inserted
BARTEL, RAINER, 01324 DRESDEN, DE, FICKERT, ANDREAS, 08209 AUERBACH, DE, LIEBERGELD, HORST, 01326 DRESDEN, DE
Year of Publication 30.01.1997
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Year of Publication 30.01.1997
Patent
Sputtering equipment for coating large substrates with ferromagnetic and non-magnetic material - has cathode target comprising sub-targets, and cooling plates contg. magnet unit and poles shoes
HOLFELD, ANDREAS., O-8027 DRESDEN, DE, WINKLER, TORSTEN, O-8060 DRESDEN, DE, HEISIG, ULLRICH., O-8052 DRESDEN, DE, LIEBERGELD, HORST, O-8054 DRESDEN, DE, FRACH, PETER., O-8051 DRESDEN, DE
Year of Publication 04.06.1992
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Year of Publication 04.06.1992
Patent