Electromechanical Piezoresistive Sensing in Suspended Graphene Membranes
Smith, A. D, Niklaus, F, Paussa, A, Vaziri, S, Fischer, A. C, Sterner, M, Forsberg, F, Delin, A, Esseni, D, Palestri, P, Östling, M, Lemme, M. C
Published in Nano letters (10.07.2013)
Published in Nano letters (10.07.2013)
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Journal Article
Bistability and Oscillatory Motion of Natural Nanomembranes Appearing within Monolayer Graphene on Silicon Dioxide
Mashoff, T, Pratzer, M, Geringer, V, Echtermeyer, T. J, Lemme, M. C, Liebmann, M, Morgenstern, M
Published in Nano letters (10.02.2010)
Published in Nano letters (10.02.2010)
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Journal Article
Bilayer insulator tunnel barriers for graphene-based vertical hot-electron transistors
Vaziri, S, Belete, M, Dentoni Litta, E, Smith, A. D, Lupina, G, Lemme, M. C, Östling, M
Published in Nanoscale (14.08.2015)
Published in Nanoscale (14.08.2015)
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Journal Article
Variability and high temperature reliability of graphene field-effect transistors with thin epitaxial CaF2 insulators
Illarionov, Yu. Yu, Knobloch, T., Uzlu, B., Banshchikov, A. G., Ivanov, I. A., Sverdlov, V., Otto, M., Stoll, S. L., Vexler, M. I., Waltl, M., Wang, Z., Manna, B., Neumaier, D., Lemme, M. C., Sokolov, N. S., Grasser, T.
Published in NPJ 2D materials and applications (19.03.2024)
Published in NPJ 2D materials and applications (19.03.2024)
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Journal Article
Precision cutting and patterning of graphene with helium ions
Bell, D C, Lemme, M C, Stern, L A, Williams, J R, Marcus, C M
Published in Nanotechnology (11.11.2009)
Published in Nanotechnology (11.11.2009)
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Journal Article
Intrinsic and extrinsic corrugation of monolayer graphene deposited on SiO2
Geringer, V, Liebmann, M, Echtermeyer, T, Runte, S, Schmidt, M, Rückamp, R, Lemme, M C, Morgenstern, M
Published in Physical review letters (20.02.2009)
Published in Physical review letters (20.02.2009)
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Journal Article
Silicon etch process options for micro- and nanotechnology using inductively coupled plasmas
Welch, C.C., Goodyear, A.L., Wahlbrink, T., Lemme, M.C., Mollenhauer, T.
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
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Journal Article
Conference Proceeding
Stability of crystalline Gd2O3 thin films on silicon during rapid thermal annealing
Czernohorsky, M, Tetzlaff, D, Bugiel, E, Dargis, R, Osten, H J, Gottlob, H D B, Schmidt, M, Lemme, M C, Kurz, H
Published in Semiconductor science and technology (01.03.2008)
Published in Semiconductor science and technology (01.03.2008)
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Journal Article
Chemical vapor deposited graphene: From synthesis to applications
Kataria, S., Wagner, S., Ruhkopf, J., Gahoi, A., Pandey, H., Bornemann, R., Vaziri, S., Smith, A. D., Ostling, M., Lemme, M. C.
Published in Physica status solidi. A, Applications and materials science (01.11.2014)
Published in Physica status solidi. A, Applications and materials science (01.11.2014)
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Journal Article
High-efficiency grating coupler for an ultralow-loss Si 3 N 4 -based platform
Chmielak, B, Suckow, S, Parra, J, Duarte, V C, Mengual, T, Piqueras, M A, Giesecke, A L, Lemme, M C, Sanchis, P
Published in Optics letters (15.05.2022)
Published in Optics letters (15.05.2022)
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Journal Article
Nanoscale TiN metal gate technology for CMOS integration
Lemme, M.C., Efavi, J.K., Mollenhauer, T., Schmidt, M., Gottlob, H.D.B., Wahlbrink, T., Kurz, H.
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
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Journal Article
Conference Proceeding
Impact of H2/N2 annealing on interface defect densities in Si(100)/SiO2/HfO2/TiN gate stacks
Schmidt, M., Lemme, M.C., Kurz, H., Witters, T., Schram, T., Cherkaoui, K., Negara, A., Hurley, P.K.
Published in Microelectronic engineering (17.06.2005)
Published in Microelectronic engineering (17.06.2005)
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Conference Proceeding
Highly selective etch process for silicon-on-insulator nano-devices
Wahlbrink, T., Mollenhauer, T., Georgiev, Y.M., Henschel, W., Efavi, J.K., Gottlob, H.D.B., Lemme, M.C., Kurz, H., Niehusmann, J., Bolivar, P. Haring
Published in Microelectronic engineering (01.03.2005)
Published in Microelectronic engineering (01.03.2005)
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Journal Article
Conference Proceeding
Supercritical drying process for high aspect-ratio HSQ nano-structures
Wahlbrink, T., Küpper, Daniel, Georgiev, Y.M., Bolten, J., Möller, M., Küpper, David, Lemme, M.C., Kurz, H.
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
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Journal Article
Conference Proceeding
Scaling potential and MOSFET integration of thermally stable Gd silicate dielectrics
Gottlob, H.D.B., Schmidt, M., Stefani, A., Lemme, M.C., Kurz, H., Mitrovic, I.Z., Davey, W.M., Hall, S., Werner, M., Chalker, P.R., Cherkaoui, K., Hurley, P.K., Piscator, J., Engström, O., Newcomb, S.B.
Published in Microelectronic engineering (01.07.2009)
Published in Microelectronic engineering (01.07.2009)
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Journal Article
Conference Proceeding
Hot-phonon temperature and lifetime in biased boron-implanted SiO2/Si/SiO2 channels
Liberis, J, Matulioniene, I, Matulionis, A, Lemme, M C, Kurz, H, Först, M
Published in Semiconductor science and technology (01.06.2006)
Published in Semiconductor science and technology (01.06.2006)
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Journal Article
Processing and evaluation of metal gate/high-κ/Si capacitors incorporating Al, Ni, TiN, and Mo as metal gate, and ZrO2 and HfO2 as high-κ dielectric
ABERMANN, S, EFAVI, J. K, SJOBLOM, G, LEMME, M. C, OLSSON, J, BERTAGNOLLI, E
Published in Microelectronic engineering (01.05.2007)
Published in Microelectronic engineering (01.05.2007)
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Conference Proceeding
Journal Article
Gentle FUSI NiSi metal gate process for high- k dielectric screening
Gottlob, H.D.B., Lemme, M.C., Schmidt, M., Echtermeyer, T.J., Mollenhauer, T., Kurz, H., Cherkaoui, K., Hurley, P.K., Newcomb, S.B.
Published in Microelectronic engineering (01.10.2008)
Published in Microelectronic engineering (01.10.2008)
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Conference Proceeding
Introduction of crystalline high- k gate dielectrics in a CMOS process
Gottlob, H.D.B., Lemme, M.C., Mollenhauer, T., Wahlbrink, T., Efavi, J.K., Kurz, H., Stefanov, Y., Haberle, K., Komaragiri, R., Ruland, T., Zaunert, F., Schwalke, U.
Published in Journal of non-crystalline solids (15.07.2005)
Published in Journal of non-crystalline solids (15.07.2005)
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