Effects of Substrate and Annealing Conditions on the Ferroelectric Properties of Non-Doped HfO2 Deposited by RF Plasma Sputter
Lim, Seokwon, Ahn, Yeonghwan, Beomho Won, Lee, Suwan, Park, Hayoung, Kumar, Mohit, Seo, Hyungtak
Published in Nanomaterials (Basel, Switzerland) (25.08.2024)
Published in Nanomaterials (Basel, Switzerland) (25.08.2024)
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