Long-Term Use of Probiotic-Containing Yogurts Is a Safe Way to Prevent Helicobacter pylori: Based on a Mongolian Gerbil's Model
Lu, Chien-Yu, Wang, Sophie S. W., Kuo, Chao-Hung, Hu, Huang-Ming, Kuo, Fu-Chen, Weng, Bi-Chuang, Wu, Chun-Chieh, Liu, Chung-Jung, Tsai, Pei-Yun, Lee, Tsung-Cheng, Chen, Li-Wei, Cheng, Kuang-Hung, Chang, Lin-Li, Wu, Deng-Chyang
Published in Biochemistry Research International (01.01.2013)
Published in Biochemistry Research International (01.01.2013)
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High resolution negative tone molecular resist based on di-functional epoxide polymerization
Lawson, Richard A., Lee, Cheng-Tsung, Tolbert, Laren M., Younkin, Todd R., Henderson, Clifford L.
Published in Microelectronic engineering (01.04.2009)
Published in Microelectronic engineering (01.04.2009)
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Conference Proceeding
Novel chemically amplified resists incorporating anionic photoacid generator functional groups for sub-50-nm half-pitch lithography
GONSALVES, Kenneth E, MINGXING WANG, LEE, Cheng-Tsung, YUEH, Wang, TAPIA-TAPIA, Melina, BATINA, Nikola, HENDERSON, Clifford L
Published in Journal of materials chemistry (01.01.2009)
Published in Journal of materials chemistry (01.01.2009)
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Journal Article
Cholesterol-lowering effect of phytosterol-containing lactic-fermented milk powder in hamsters
Chien, Yung Liang, Wu, Liang Yi, Lee, Tsung Cheng, Hwang, Lucy Sun
Published in Food chemistry (01.04.2010)
Published in Food chemistry (01.04.2010)
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Journal Article
Fullerene Grafted Photoacid Generator(PAG) Bound Polymer Resists
Wang, Mingxing, Lee, Cheng-Tsung, Henderson, Clifford L., Gonsalves, Kenneth
Published in Journal of Photopolymer Science and Technology (01.01.2008)
Published in Journal of Photopolymer Science and Technology (01.01.2008)
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Journal Article
Epoxide functionalized molecular resists for high resolution electron-beam lithography
Lawson, Richard A., Lee, Cheng-Tsung, Yueh, Wang, Tolbert, Laren, Henderson, Clifford L.
Published in Microelectronic engineering (01.05.2008)
Published in Microelectronic engineering (01.05.2008)
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Journal Article
Conference Proceeding
Effect of acid anion on the behavior of single component molecular resists incorporating ionic photoacid generators
Lawson, Richard A., Lee, Cheng-Tsung, Tolbert, Laren M., Henderson, Clifford L.
Published in Microelectronic engineering (01.04.2009)
Published in Microelectronic engineering (01.04.2009)
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Journal Article
Conference Proceeding
The effect of direct PAG incorporation into the polymer main chain on reactive ion etch resistance of 193 nm and EUV chemically amplified resists
LEE, Cheng-Tsung, HENDERSON, Clifford L, MINGXING WANG, GONSALVES, Kenneth E, YUEH, Wang, ROBERTS, Jeanette M
Published in Microelectronic engineering (01.05.2008)
Published in Microelectronic engineering (01.05.2008)
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Conference Proceeding
Journal Article
Incorporation of ionic photoacid generator (PAG) and base quencher into the resist polymer main chain for sub-50 nm resolution patterning
MINGXING WANG, LEE, Cheng-Tsung, HENDERSON, Clifford L, YUEH, Wang, ROBERTS, Jeanette M, GONSALVES, Kenneth E
Published in Journal of materials chemistry (01.01.2008)
Published in Journal of materials chemistry (01.01.2008)
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Journal Article
The effect of direct PAG incorporation into the polymer main chain on reactive ion etch resistance of 193nm and EUV chemically amplified resists
Lee, Cheng-Tsung, Henderson, Clifford L., Wang, Mingxing, Gonsalves, Kenneth E., Yueh, Wang, Roberts, Jeanette M.
Published in Microelectronic engineering (01.05.2008)
Published in Microelectronic engineering (01.05.2008)
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Journal Article
Fullerene Grafted Photoacid Generator(PAG) Bound Polymer Resists
Wang, Mingxing, Lee, Cheng-Tsung, L. Henderson, Clifford, Gonsalves, Kenneth
Published in Journal of photopolymer science and technology (01.11.2008)
Published in Journal of photopolymer science and technology (01.11.2008)
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Journal Article