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Fundamentals and limits for the EUV emission of pinch plasma sources for EUV lithography : Special cluster on extreme ultraviolet light sources for semiconductor manufacturing
KRÜCKEN, Thomas, BERGMANN, Klaus, JUSCHKIN, Larissa, LEBERT, Rainer
Published in Journal of physics. D, Applied physics (2004)
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Published in Journal of physics. D, Applied physics (2004)
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A multi-kilohertz pinch plasma radiation source for extreme ultraviolet lithography
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Published in Microelectronic engineering (01.09.2001)
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Conference Proceeding
Participation of cyclooxygenase-1 in prostaglandin E 2 release from synovitis tissue in primary osteoarthritis in vitro
Knorth, Holger, Dorfmüller, Peter, Lebert, Rainer, Schmidt, Wolfgang E., Wittenberg, Ralf H., Heukamp, Matthias, Wiese, Matthias, Willburger, Roland E.
Published in Osteoarthritis and cartilage (01.08.2004)
Published in Osteoarthritis and cartilage (01.08.2004)
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MARYASOV, Oleksiy, LEBERT, Rainer, MISSALLA, Thomas, PILCH, Iris, BRUCK, Robert
Year of Publication 04.04.2024
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EUV-Strahlungsquellensystem mit Kontaminationsunterdrückung
Phiesel, Christoph Sebastian, Pilch, Iris, Missalla, Thomas, Haase, Anton, Puetz, Hendrik, Lebert, Rainer, Loopstra, Erik
Year of Publication 10.10.2024
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Messverfahren der EUV-Reflektometrie und EUV-Reflektometer
Schwab, Markus, Pilch, Iris, Haase, Anton, Maryasov, Oleksiy, Lebert, Rainer, Loopstra, Erik
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Electrode phenomena and lifetime considerations in a radial multichannel pseudospark switch
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Published in IEEE transactions on plasma science (01.10.2000)
Published in IEEE transactions on plasma science (01.10.2000)
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