Atomic layer etching of tungsten for enhanced tungsten deposition fill
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Year of Publication 01.05.2022
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Year of Publication 01.05.2022
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ATOMIC LAYER ETCHING OF TUNGSTEN FOR ENHANCED TUNGSTEN DEPOSITION FILL
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Year of Publication 30.03.2017
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Year of Publication 05.02.2015
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Atomic layer etching of tungsten for enhanced tungsten deposition fill
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Year of Publication 01.11.2021
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Year of Publication 01.11.2021
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Atomic layer etching of tungsten for enhanced tungsten deposition fill
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Year of Publication 10.09.2021
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Year of Publication 10.09.2021
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Year of Publication 03.04.2020
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Year of Publication 03.04.2020
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Year of Publication 16.12.2018
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Year of Publication 16.12.2018
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Year of Publication 01.06.2018
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Year of Publication 01.06.2018
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Year of Publication 16.02.2019
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Year of Publication 16.02.2019
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Year of Publication 24.01.2020
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Year of Publication 24.01.2020
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NA, JEONG-SEOK, HUMAYUN, RAASHINA, DANEK, MICHAL, ASHTIANI, KAIHAN ABIDI, LAI, CHIUKIN STEVEN
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Year of Publication 30.09.2014
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Year of Publication 30.09.2014
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Low resistivity films containing molybdenum
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Year of Publication 23.07.2014
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Year of Publication 20.03.2014
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Methods and apparatuses for atomic layer cleaning of contacts and vias
GAO, JU-WEN, DANEK, MICHAL, FELLIS, AARON R, LAI, CHIUKIN STEVEN, JUAREZ, FRANCISCO J
Year of Publication 01.06.2015
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Year of Publication 01.06.2015
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