NiPt salicide process improvement for 28nm CMOS with Pt(10%) additive
Lai, Jerander, Chen, Yi-Wei, Ho, Nien-Ting, Shiu, Yu Shan, Lin, J.F., Lei, Shuen Chen, Chang, Nick Z.H., Chou, Ling Chun, Huang, C.C., Wu, J.Y.
Published in Microelectronic engineering (01.04.2012)
Published in Microelectronic engineering (01.04.2012)
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Journal Article
NiPt salicide process improvement for 28 nm CMOS with Pt(10%) additive
LAI, Jerander, CHEN, Yi-Wei, HO, Nien-Ting, YU SHAN SHIU, LIN, J. F, SHUEN CHEN LEI, CHANG, Nick Z. H, LING CHUN CHOU, HUANG, C. C, WU, J. Y
Published in Microelectronic engineering (01.04.2012)
Published in Microelectronic engineering (01.04.2012)
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Conference Proceeding
Journal Article
A comprehensive study for advanced in situ contact dry cleaning
Tsai, T.C., Chen, Y.W., Lai, Jerander, Lin, J.F., Huang, C.C., Wu, J.Y.
Published in Microelectronic engineering (01.04.2012)
Published in Microelectronic engineering (01.04.2012)
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Journal Article
Conference Proceeding
Advances on NiPt SALICIDE process optimization for 28nm CMOS manufacturing
Yi-Wei Chen, Nien-Ting Ho, Lai, J, Lin, J F, Huang, C C, Wu, J Y, Chu, J M M, Butterbaugh, J W
Published in 2010 International Symposium on Semiconductor Manufacturing (ISSM) (01.10.2010)
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Published in 2010 International Symposium on Semiconductor Manufacturing (ISSM) (01.10.2010)
Conference Proceeding
Investigation pre-amorphization implantation on nickel silicide formation
Pin Hong Chen, Chia Chang Hsu, Lai, Jerander, Liao, Boris, Chun Ling Lin, Huang, Olivia, Chun Chieh Chiu, Hsu, C. M., Wu, J. Y.
Published in IEEE International Interconnect Technology Conference (01.05.2014)
Published in IEEE International Interconnect Technology Conference (01.05.2014)
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Conference Proceeding
Integrated NiSi defect reductions in 45nm node and beyond
Lai, J., Yi-Wei Chen, Nien-Ting Ho, Lin, J. F., Huang, C. C., Wu, J. Y.
Published in 2011 IEEE International Interconnect Technology Conference (01.05.2011)
Published in 2011 IEEE International Interconnect Technology Conference (01.05.2011)
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Conference Proceeding
Advances on 32nm NiPt Salicide process
Yi-Wei Chen, Nien-Ting Ho, Lai, J., Tsai, T.C., Huang, C.C., Wu, J.Y., Ng, B., Mayur, A.J., Tang, A., Muthukrishnan, S., Zelenko, J., Yang, H.
Published in 2009 17th International Conference on Advanced Thermal Processing of Semiconductors (01.09.2009)
Published in 2009 17th International Conference on Advanced Thermal Processing of Semiconductors (01.09.2009)
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Conference Proceeding