Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
Cho, Haewon, Lee, Namgue, Choi, Hyeongsu, Park, Hyunwoo, Jung, Chanwon, Song, Seokhwi, Yuk, Hyunwoo, Kim, Youngjoon, Kim, Jong-Woo, Kim, Keunsik, Choi, Youngtae, Park, Suhyeon, Kwon, Yurim, Jeon, Hyeongtag
Published in Applied sciences (01.09.2019)
Published in Applied sciences (01.09.2019)
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