Search Results - "Kwon, K. H" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

Gene-microbiota interactions contribute to the pathogenesis of inflammatory bowel disease

Gene-microbiota interactions contribute to the pathogenesis of inflammatory bowel disease

by Chu, Hiutung, Khosravi, Arya, Kusumawardhani, Indah P., Kwon, Alice H. K., Vasconcelos, Anilton C., Cunha, Larissa D., Mayer, Anne E., Shen, Yue, Wu, Wei-Li, Kambal, Amal, Targan, Stephan R., Xavier, Ramnik J., Ernst, Peter B., Green, Douglas R., McGovern, Dermot P. B., Virgin, Herbert W., Mazmanian, Sarkis K.
Published in Science (American Association for the Advancement of Science) (27.05.2016)

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An observational study of hydrodynamic impact on water mass transport due to tidal power generation

An observational study of hydrodynamic impact on water mass transport due to tidal power generation

by Kim, J.W., Woo, S.-B., Song, J.I., Kwon, H.-K.
Published in The Science of the total environment (10.02.2022)

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Unbalanced sediment transport by tidal power generation in Lake Sihwa

Unbalanced sediment transport by tidal power generation in Lake Sihwa

by Kim, J.W., Ha, H.K., Woo, S.-B., Kim, M.-S., Kwon, H.-K.
Published in Renewable energy (01.07.2021)

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Parameters of Gaseous Phase and Kinetics of Reactive Ion Etching of SiO2 in CF4/C4F8/Ar/He Plasma

Parameters of Gaseous Phase and Kinetics of Reactive Ion Etching of SiO2 in CF4/C4F8/Ar/He Plasma

by Efremov, A. M., Kwon, K.-H.
Published in Russian microelectronics (01.12.2022)

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Concentration of Fluorine Atoms and Kinetics of Reactive-Ion Etching of Silicon in CF4 + O2, CHF3 + O2, and C4F8 + O2 Mixtures

Concentration of Fluorine Atoms and Kinetics of Reactive-Ion Etching of Silicon in CF4 + O2, CHF3 + O2, and C4F8 + O2 Mixtures

by Efremov, A. M., Bobylev, A. V., Kwon, K.-H.
Published in Russian microelectronics (01.08.2023)

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Kinetics of Reactive Ion Etching of Si, SiO2, and Si3N4 in C4F8 + O2 + Ar Plasma: Effect of the C4F8/O2 Mixing Ratio

Kinetics of Reactive Ion Etching of Si, SiO2, and Si3N4 in C4F8 + O2 + Ar Plasma: Effect of the C4F8/O2 Mixing Ratio

by Efremov, A. M., Kwon, K.-H.
Published in Russian microelectronics (01.03.2021)

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Plasma Parameters and Kinetics of Reactive Ion Etching of SiO2 and Si3N4 in an HBr/Cl2/Ar Mixture

Plasma Parameters and Kinetics of Reactive Ion Etching of SiO2 and Si3N4 in an HBr/Cl2/Ar Mixture

by Efremov, A. M., Betelin, V. B., Kwon, K.-H.
Published in Russian microelectronics (01.04.2023)

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On the Mechanisms Regulating the Plasma Composition and Kinetics of Heterogeneous Processes in a CF4 + CHF3 + Ar Mixture

On the Mechanisms Regulating the Plasma Composition and Kinetics of Heterogeneous Processes in a CF4 + CHF3 + Ar Mixture

by Efremov, A. M., Betelin, V. B., Kwon, K.-H.
Published in Russian microelectronics (01.10.2022)

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Plasma Parameters and Kinetics of Reactive-Ion Etching of Silicon in a C6F12O + Ar Mixture

Plasma Parameters and Kinetics of Reactive-Ion Etching of Silicon in a C6F12O + Ar Mixture

by Efremov, A. M., Betelin, V. B., Kwon, K.-H.
Published in Russian microelectronics (01.08.2022)

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Mechanisms of Plasma Etching of Titanium, Indium, Tin, and Zinc Oxides in a Mixture of HBr + Ar

Mechanisms of Plasma Etching of Titanium, Indium, Tin, and Zinc Oxides in a Mixture of HBr + Ar

by Efremov, A. M., Smirnov, S. A., Betelin, V. B., Kwon, K.-H.
Published in Russian microelectronics (01.11.2021)

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Specific Features of the Kinetics of the Reactive-Ion Etching of Si and SiO2 in a CF4 + O2 Mixture in a Low Power Supply Mode

Specific Features of the Kinetics of the Reactive-Ion Etching of Si and SiO2 in a CF4 + O2 Mixture in a Low Power Supply Mode

by Efremov, A. M., Betelin, V. B., Kwon, K.-H.
Published in Russian microelectronics (01.09.2021)

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Percolated pore networks of oxygen plasma-activated multi-walled carbon nanotubes for fast response, high sensitivity capacitive humidity sensors

Percolated pore networks of oxygen plasma-activated multi-walled carbon nanotubes for fast response, high sensitivity capacitive humidity sensors

by Hong, H P, Jung, K H, Kim, J H, Kwon, K H, Lee, C J, Yun, K N, Min, N K
Published in Nanotechnology (01.03.2013)

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Kinetics of the Volumetric and Heterogeneous Processes in the Plasma of a C4F8 + O2 + Ar Mixture

Kinetics of the Volumetric and Heterogeneous Processes in the Plasma of a C4F8 + O2 + Ar Mixture

by Efremov, A. M., Murin, D. B., Sobolev, A. M., Kwon, K.-H.
Published in Russian microelectronics (2021)

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Journal Article

Kinetics and Mechanisms of Reactive-Ion Etching of Si and SiO2 in a Plasma of a Mixture of HBr + O2

Kinetics and Mechanisms of Reactive-Ion Etching of Si and SiO2 in a Plasma of a Mixture of HBr + O2

by Efremov, A. M., Betelin, V. B., Kwon, K.-H.
Published in Russian microelectronics (01.11.2020)

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Journal Article

Special Aspects of the Kinetics of Reactive Ion Etching of SiO2 in Fluorine-, Chlorine-, and Bromine-Containing Plasma

Special Aspects of the Kinetics of Reactive Ion Etching of SiO2 in Fluorine-, Chlorine-, and Bromine-Containing Plasma

by Efremov, A. M., Murin, D. B., Betelin, V. B., Kwon, K.-H.
Published in Russian microelectronics (01.03.2020)

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Concerning the Effect of Type of Fluorocarbon Gas on the Output Characteristics of the Reactive-Ion Etching Process

Concerning the Effect of Type of Fluorocarbon Gas on the Output Characteristics of the Reactive-Ion Etching Process

by Efremov, A. M., Murin, D. B., Kwon, K.-H.
Published in Russian microelectronics (01.05.2020)

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Journal Article

Parameters of Plasma and Way of Etching Silicon in a CF4 + CHF3 + O2 Mixture

Parameters of Plasma and Way of Etching Silicon in a CF4 + CHF3 + O2 Mixture

by Efremov, A. M., Murin, D. B., Kwon, K.-H.
Published in Russian microelectronics (01.11.2019)

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Plasma Parameters and Kinetics of Active Particles in the Mixture CHF3 + O2 + Ar

Plasma Parameters and Kinetics of Active Particles in the Mixture CHF3 + O2 + Ar

by Efremov, A. M., Murin, D. B., Kwon, K.-H.
Published in Russian microelectronics (2020)

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Effect of dentinal tubule occlusion by dentifrice containing nano-carbonate apatite

Effect of dentinal tubule occlusion by dentifrice containing nano-carbonate apatite

by LEE, S. Y., KWON, H. K., KIM, B. I.
Published in Journal of oral rehabilitation (01.11.2008)

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Oncological and functional results after the surgical treatment of parotid cancer

Oncological and functional results after the surgical treatment of parotid cancer

by Chung, E.-J, Lee, S.-H, Baek, S.-H, Kwon, K.-H, Chang, Y.-J, Rho, Y.-S
Published in International journal of oral and maxillofacial surgery (01.01.2015)

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