Platinum etching and plasma characteristics in RF magnetron and electron cyclotron resonance plasmas
NISHIKAWA, K, KUSUMI, Y, OOMORI, T, HANAZAKI, M, NAMBA, R
Published in Japanese Journal of Applied Physics (01.12.1993)
Published in Japanese Journal of Applied Physics (01.12.1993)
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Conference Proceeding
Journal Article
Effect of N 2 Addition on Aluminum Alloy Etching by Electron Cyclotron Resonance Reactive Ion Etching and Magnetically Enhanced Reactive Ion Etching
Kusumi, Yoshihiro, Fujiwara, Nobuo, Matsumoto, Junko, Masahiro Yoneda, Masahiro Yoneda
Published in Japanese Journal of Applied Physics (01.04.1995)
Published in Japanese Journal of Applied Physics (01.04.1995)
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Journal Article