Deformation Analysis of ArF Resist Pattern by using AFM
Kurano, Kazutoshi, Kishioka, Takahiro, Hiroi, Yoshiomi, Ohashi, Takuya, Kawai, Akira
Published in Journal of Photopolymer Science and Technology (01.01.2007)
Published in Journal of Photopolymer Science and Technology (01.01.2007)
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Journal Article
Peeling Analysis of ArF Resist Pattern on BARC by using AFM
Kurano, Kazutoshi, Kishioka, Takahiro, Hiroi, Yoshiomi, Ohashi, Takuya, Kawai, Akira
Published in Journal of Photopolymer Science and Technology (01.01.2007)
Published in Journal of Photopolymer Science and Technology (01.01.2007)
Get full text
Journal Article