Thermal effects on TiN/Ti/HfO2/Pt memristors charge conduction
Jiménez-Molinos, F., Vinuesa, G., García, H., Tarre, A., Tamm, A., Kalam, K., Kukli, K., Dueñas, S., Castán, H., González, M. B., Campabadal, F., Roldán, J. B.
Published in Journal of applied physics (21.11.2022)
Published in Journal of applied physics (21.11.2022)
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Journal Article
The Role of Defects in the Resistive Switching Behavior of Ta2O5-TiO2-Based Metal–Insulator–Metal (MIM) Devices for Memory Applications
Dueñas, S., Castán, H., García, H., Ossorio, O. G., Domínguez, L. A., Seemen, H., Tamm, A., Kukli, K., Aarik, J.
Published in Journal of electronic materials (01.09.2018)
Published in Journal of electronic materials (01.09.2018)
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Journal Article
Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Tetrakis(ethylmethylamide) and Water
Kukli, K., Ritala, M., Sajavaara, T., Keinonen, J., Leskelä, M.
Published in Chemical vapor deposition (03.09.2002)
Published in Chemical vapor deposition (03.09.2002)
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Journal Article
Conduction and stability of holmium titanium oxide thin films grown by atomic layer deposition
Castán, H., García, H., Dueñas, S., Bailón, L., Miranda, E., Kukli, K., Kemell, M., Ritala, M., Leskelä, M.
Published in Thin solid films (30.09.2015)
Published in Thin solid films (30.09.2015)
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Journal Article
Nitrogen induced modifications of MANOS memory properties
Nikolaou, N., Ioannou-Sougleridis, V., Dimitrakis, P., Normand, P., Skarlatos, D., Giannakopoulos, K., Ladas, S., Pecassou, B., BenAssayag, G., Kukli, K., Niinistö, J., Ritala, M., Leskelä, M.
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (15.12.2015)
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (15.12.2015)
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Journal Article
Influence of single and double deposition temperatures on the interface quality of atomic layer deposited Al2O3 dielectric thin films on silicon
Dueñas, S., Castán, H., García, H., de Castro, A., Bailón, L., Kukli, K., Aidla, A., Aarik, J., Mändar, H., Uustare, T., Lu, J., Hårsta, A.
Published in Journal of applied physics (01.03.2006)
Published in Journal of applied physics (01.03.2006)
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Journal Article
Charge and current hysteresis in dysprosium-doped zirconium oxide thin films
Castán, H., Dueñas, S., García, H., Bailón, L., Kukli, K., Tamm, A., Kozlova, J., Aarik, J., Mizohata, K.
Published in Microelectronic engineering (01.11.2015)
Published in Microelectronic engineering (01.11.2015)
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Journal Article
Crystallization in hafnia- and zirconia-based systems
Ushakov, S. V., Navrotsky, A., Yang, Y., Stemmer, S., Kukli, K., Ritala, M., Leskelä, M. A., Fejes, P., Demkov, A., Wang, C., Nguyen, B.-Y., Triyoso, D., Tobin, P.
Published in Physica Status Solidi (b) (01.08.2004)
Published in Physica Status Solidi (b) (01.08.2004)
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Journal Article
Conference Proceeding
Influence of growth and annealing temperatures on the electrical properties of Nb2O5-based MIM capacitors
García, H, Castán, H, Perez, E, Dueñas, S, Bailón, L, Blanquart, T, Niinistö, J, Kukli, K, Ritala, M, Leskelä, M
Published in Semiconductor science and technology (10.05.2013)
Published in Semiconductor science and technology (10.05.2013)
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Journal Article
A comparative study of the electrical properties of TiO2 films grown by high-pressure reactive sputtering and atomic layer deposition
Dueñas, S, Castán, H, García, H, Andrés, E San, Toledano-Luque, M, Mártil, I, González-Díaz, G, Kukli, K, Uustare, T, Aarik, J
Published in Semiconductor science and technology (01.10.2005)
Published in Semiconductor science and technology (01.10.2005)
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Journal Article
Single-parameter model for the post-breakdown conduction characteristics of HoTiOx-based MIM capacitors
Blasco, J., Castán, H., García, H., Dueñas, S., Suñé, J., Kemell, M., Kukli, K., Ritala, M., Leskelä, M., Miranda, E.
Published in Microelectronics and reliability (01.09.2014)
Published in Microelectronics and reliability (01.09.2014)
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Journal Article
Conference Proceeding
Electrical Properties of Atomic-Layer-Deposited Thin Gadolinium Oxide High-k Gate Dielectrics
Dueñas, S., Castán, H., García, H., Gómez, A., Bailón, L., Kukli, K., Hatanpää, T., Lu, J., Ritala, M., Leskelä, M.
Published in Journal of the Electrochemical Society (2007)
Published in Journal of the Electrochemical Society (2007)
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Journal Article
Atomic Layer Deposition and Properties of Lanthanum Oxide and Lanthanum-Aluminum Oxide Films
Kukli, K., Ritala, M., Pore, V., Leskelä, M., Sajavaara, T., Hegde, R. I., Gilmer, D. C., Tobin, P. J., Jones, A. C., Aspinall, H. C.
Published in Chemical vapor deposition (01.03.2006)
Published in Chemical vapor deposition (01.03.2006)
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Journal Article
Analytical TEM characterization of the interfacial layer between ALD HfO2 film and silicon substrate
LU, J, AARIK, J, SUNDQVIST, J, KUKLI, K, HARSTA, A, CARLSSON, J.-O
Published in Journal of crystal growth (03.01.2005)
Published in Journal of crystal growth (03.01.2005)
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Journal Article
Atomic Layer Deposition of Hafnium Dioxide Films Using Hafnium Bis(2-butanolate)bis(1-methoxy-2-methyl-2-propanolate) and Water
Kukli, K., Ritala, M., Leskelä, M., Sajavaara, T., Keinonen, J., Jones, A.C., Roberts, J.L.
Published in Advanced materials (Weinheim) (17.12.2003)
Published in Advanced materials (Weinheim) (17.12.2003)
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Journal Article
Dry-etched silicon-on-insulator waveguides with low propagation and fiber-coupling losses
Solehmainen, K., Aalto, T., Dekker, J., Kapulainen, M., Harjanne, M., Kukli, K., Heimala, P., Kolari, K., Leskela, M.
Published in Journal of lightwave technology (01.11.2005)
Published in Journal of lightwave technology (01.11.2005)
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Journal Article
Atomic layer deposition of polycrystalline HfO2 films by the HfI4-O2 precursor combination
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Conference Proceeding
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