CMOS shallow-trench-isolation to 50-nm channel widths
VanDerVoom, P., Gan, D., Krusius, J.P.
Published in IEEE transactions on electron devices (01.06.2000)
Published in IEEE transactions on electron devices (01.06.2000)
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Journal Article
Approaches toward ultralarge FPDs
Krusius, J.P., Seraphim, D.P., Greene, R.G., Skinner, D.S., Yost, B.
Published in Proceedings of the IEEE (01.04.2002)
Published in Proceedings of the IEEE (01.04.2002)
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Journal Article
Series resistance of silicided ohmic contacts for nanoelectronics
Chieh, Y.-S., Perera, A.K., Krusius, J.P.
Published in IEEE transactions on electron devices (01.08.1992)
Published in IEEE transactions on electron devices (01.08.1992)
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Journal Article
Chemically Assisted Ion Beam Etching for Silicon‐Based Microfabrication
Chieh, Y. S., Krusius, J. P., Chapman, P.
Published in Journal of the Electrochemical Society (01.06.1994)
Published in Journal of the Electrochemical Society (01.06.1994)
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Journal Article
Field oxide thinning in poly buffer LOCOS isolation with active area spacings to 0.1 μm
LUTZE, J. W, PERERA, A. H, KRUSIUS, J. P
Published in Journal of the Electrochemical Society (01.06.1990)
Published in Journal of the Electrochemical Society (01.06.1990)
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Journal Article
Band renormalization and dynamic screening in near band gap femtosecond optical probing of InGaAs
Bair, J.E., Cohen, D., Krusius, J.P., Pollock, C.R.
Published in Solid state communications (01.10.1994)
Published in Solid state communications (01.10.1994)
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Journal Article
Lateral space-charge effects on ballistic electron transport across graded heterojunctions
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Journal Article
Conference Proceeding
Spin-on-glass for 200 nm trench isolation structures
Lutze, J W, Shacham-Diamand, Y Y, Krusius, J P
Published in Journal of micromechanics and microengineering (01.03.1991)
Published in Journal of micromechanics and microengineering (01.03.1991)
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Journal Article