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Inspection of holes formed in semiconductor samples
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Year of Publication 26.12.2023
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Measuring height differences in pattern on semiconductor wafer
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TECHNIQUE FOR MEASURING OVERLAY BETWEEN LAYERS OF A MULTILAYER STRUCTURE
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Year of Publication 20.09.2018
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Roughness characterization of gate all around Silicon Nano Wire fabrication
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Published in 2012 IEEE 27th Convention of Electrical and Electronics Engineers in Israel (01.11.2012)
Published in 2012 IEEE 27th Convention of Electrical and Electronics Engineers in Israel (01.11.2012)
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Conference Proceeding
Technique for measuring overlay between layers of a multilayer structure
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Year of Publication 13.03.2018
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Method and system for measuring height difference in patterns on semiconductor wafers
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Year of Publication 11.03.2022
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Year of Publication 11.03.2022
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CD-SEM technique for wafers fabrication control
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Year of Publication 21.11.2017
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Year of Publication 21.11.2017
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TECHNIQUE FOR MEASURING OVERLAY BETWEEN LAYERS OF A MULTILAYER STRUCTURE
RATHORE Dhananjay Singh, KRIS Roman, GOLDMAN Ran, ADAN Ofer, SCHWARZBAND Ishai, NOVAK Olga, LEVI Shimon, ZAUER Itay, WEINBERG Yakov
Year of Publication 24.08.2017
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Year of Publication 24.08.2017
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METHOD, SYSTEM AND COMPUTER MEDIUM FOR PROCESS CONTROL OF SEMICONDUCTOR STRUCTURE INCLUDING STAIRCASE
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Year of Publication 21.05.2023
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Year of Publication 21.05.2023
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CD-SEM TECHNIQUE FOR WAFERS FABRICATION CONTROL
KRIS Roman, GOLDMAN Ran, SCHWARZBAND Ishai, ENGLANDER Arbel, NOIFELD Efrat, IVANCHENKO Yan, SHOVAL Ori, WEINBERG Yakov, LANGE Dan
Year of Publication 06.07.2017
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Year of Publication 06.07.2017
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