Observation of plasma inflows in laser-produced Sn plasma and their contribution to extreme-ultraviolet light output enhancement
Tomita, Kentaro, Pan, Yiming, Sunahara, Atsushi, Kouge, Kouichiro, Mizoguchi, Hakaru, Nishihara, Katsunobu
Published in Scientific reports (01.02.2023)
Published in Scientific reports (01.02.2023)
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Journal Article
Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources
Tomita, Kentaro, Sato, Yuta, Tsukiyama, Syouichi, Eguchi, Toshiaki, Uchino, Kiichiro, Kouge, Kouichiro, Tomuro, Hiroaki, Yanagida, Tatsuya, Wada, Yasunori, Kunishima, Masahito, Soumagne, Georg, Kodama, Takeshi, Mizoguchi, Hakaru, Sunahara, Atsushi, Nishihara, Katsunobu
Published in Scientific reports (02.10.2017)
Published in Scientific reports (02.10.2017)
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Journal Article
Feasibility study on reactive ion etching occurrence in EUV-induced photoionized hydrogen plasmas based on electron temperature and electron density measurements
Kouge, Kouichiro, Tomita, Kentaro, Hotta, Junya, Pan, Yiming, Tomuro, Hiroaki, Yanagida, Tatsuya, Uchino, Kiichiro, Yamamoto, Naoji
Published in Japanese Journal of Applied Physics (01.05.2022)
Published in Japanese Journal of Applied Physics (01.05.2022)
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Journal Article
Time-resolved spatial profiles of electron density and temperature in hydrogen plasmas induced by radiation from laser-produced tin plasmas for extreme ultraviolet lithography light sources
Kouge, Kouichiro, Tomita, Kentaro, Hotta, Junya, Pan, Yiming, Tomuro, Hiroaki, Morita, Masayuki, Yanagida, Tatsuya, Uchino, Kiichiro, Yamamoto, Naoji
Published in Japanese Journal of Applied Physics (01.06.2021)
Published in Japanese Journal of Applied Physics (01.06.2021)
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Journal Article
Update of Development Progress of the High Power LPP-EUV Light Source Using a Magnetic Field
Kouge, Kouichiro, Nagai, Shinji, Hori, Tsukasa, Ueno, Yoshifumi, Yanagida, Tatsuya, Miyao, Kenichi, Hayashi, Hideyuki, Watanabe, Yukio, Abe, Tamotsu, Nakarai, Hiroaki, Saito, Takashi, Mizoguchi, Hakaru
Published in Journal of Photopolymer Science and Technology (01.07.2020)
Published in Journal of Photopolymer Science and Technology (01.07.2020)
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Journal Article
Spatial profiles of electron density, electron temperature, average ionic charge, and EUV emission of laser-produced Sn plasmas for EUV lithography
Sato, Yuta, Tomita, Kentaro, Tsukiyama, Syoichi, Eguchi, Toshiaki, Uchino, Kiichiro, Kouge, Kouichiro, Tomuro, Hiroaki, Yanagida, Tatsuya, Wada, Yasunori, Kunishima, Masahito, Kodama, Takeshi, Mizoguchi, Hakaru
Published in Japanese Journal of Applied Physics (01.03.2017)
Published in Japanese Journal of Applied Physics (01.03.2017)
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