Low-Temperature Atomic Layer Deposition of Copper Metal Thin Films: Self-Limiting Surface Reaction of Copper Dimethylamino-2-propoxide with Diethylzinc
Lee, Byoung H, Hwang, Jae K, Nam, Jae W, Lee, Song U, Kim, Jun T, Koo, Sang-M, Baunemann, A, Fischer, Roland A, Sung, Myung M
Published in Angewandte Chemie (International ed.) (08.06.2009)
Published in Angewandte Chemie (International ed.) (08.06.2009)
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Journal Article
Low-Temperature Atomic Layer Deposition of Copper Metal Thin Films: Self-Limiting Surface Reaction of Copper Dimethylamino-2-propoxide with Diethylzinc
Lee, Byoung H., Hwang, Jae K., Nam, Jae W., Lee, Song U., Kim, Jun T., Koo, Sang-M., Baunemann, A., Fischer, Roland A., Sung, Myung M.
Published in Angewandte Chemie (08.06.2009)
Published in Angewandte Chemie (08.06.2009)
Get full text
Journal Article
Low‐Temperature Atomic Layer Deposition of Copper Metal Thin Films: Self‐Limiting Surface Reaction of Copper Dimethylamino‐2‐propoxide with Diethylzinc
Lee, Byoung H., Hwang, Jae K., Nam, Jae W., Lee, Song U., Kim, Jun T., Koo, Sang‐M., Baunemann, A., Fischer, Roland A., Sung, Myung M.
Published in Angewandte Chemie (08.06.2009)
Published in Angewandte Chemie (08.06.2009)
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