Preparation of Patternable High Resolution and High Refractive Index Materials for AR/VR
Hikida, Jiro, Chisaka, Hiroki, Ijima, Yoichiro, Liao, Yuehchun, Konno, Kenri, Hirano, Isao, Misumi, Kouichi, Shiota, Dai, Ohmori, Katsumi
Published in Proceedings of the International Display Workshops (10.12.2020)
Published in Proceedings of the International Display Workshops (10.12.2020)
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Journal Article
RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN
KONNO KENRI, KAWANA DAISUKE, SUZUKI KENTA, FUJII TATSUYA, IWASHITA JUN
Year of Publication 10.04.2014
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Year of Publication 10.04.2014
Patent