Impedance Control of Reactive Sputtering Process in Mid-Frequency Mode with Dual Cathodes to Deposit Al-Doped ZnO Films
Kon, Masato, Song, Pung Keun, Shigesato, Yuzo, Frach, Peter, Ohno, Shingo, Suzuki, Koichi
Published in Japanese Journal of Applied Physics (01.01.2003)
Published in Japanese Journal of Applied Physics (01.01.2003)
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