Self-Consistent Monte Carlo Device Simulation of Capture-Excitation Processes of Carriers
Hashimoto, Futo, Suzuki, Toma, Minari, Hideki, Nakazaki, Nobuya, Komachi, Jun, Sano, Nobuyuki
Published in 2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (27.09.2023)
Published in 2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (27.09.2023)
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Conference Proceeding
Ab Initio Analysis on Stability of Metal Atoms in β-Si 3 N 4 /Si Structure
Shibata, Daiki, Kobayashi, Syunsuke, Sueoka, Koji, Komachi, Jun, Saga, Koichiro
Published in ECS transactions (07.08.2014)
Published in ECS transactions (07.08.2014)
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Journal Article
Modeling and Simulation of Plasma-Induced Damage Distribution during Hole Etching of SiO2 over Si Substrate by Fluorocarbon Plasma
Kuboi, Nobuyuki, Tatsumi, Tetsuya, Kobayashi, Shoji, Kinoshita, Takashi, Komachi, Jun, Fukasawa, Masanaga, Ansai, Hisahiro
Published in Applied physics express (01.12.2012)
Published in Applied physics express (01.12.2012)
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Journal Article
Ab Initio Analysis on Stability of Metal Atoms in β-Si3N4/Si Structure
Shibata, Daiki, Kobayashi, Syunsuke, Sueoka, Koji, Komachi, Jun, Saga, Koichiro
Published in ECS transactions (07.08.2014)
Published in ECS transactions (07.08.2014)
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Journal Article
Ab Initio Analysis on Stability of Metal Atoms in β-Si 3 N 4 /Si Structure
Shibata, Daiki, Kobayashi, Syunsuke, Sueoka, Koji, Komachi, Jun, Saga, Koichiro
Published in Meeting abstracts (Electrochemical Society) (05.08.2014)
Published in Meeting abstracts (Electrochemical Society) (05.08.2014)
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Journal Article