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Physical Chemistry of Water Droplets in Wafer Cleaning with Low Water Use
by
van der Donck, Jacques C.J.
,
Bakker, Jurrian
,
van der Zon, Ben C.M.B.
,
Smeltink, Jeroen A.
,
Kolderweij
,
Robin B.J
.
,
van Kleef, Marc H.
Published in
Solid state phenomena
(01.09.2014)
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Journal Article
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engineering
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cleaning
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contact angle
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droplet manipulation
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low upw use
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English
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ProQuest Technology Collection
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