Investigation of the four-gate action in G(4)-FETs
Dufrene, B, Akarvardar, K, Cristoloveanu, S, Blalock, B J, Gentil, R, Kolawa, E, Mojarradi, M M
Published in IEEE transactions on electron devices (01.11.2004)
Published in IEEE transactions on electron devices (01.11.2004)
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Full field measurements of curvature using coherent gradient sensing: application to thin film characterization
Rosakis, A.J, Singh, R.P, Tsuji, Y, Kolawa, E, Moore, N.R
Published in Thin solid films (18.07.1998)
Published in Thin solid films (18.07.1998)
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Reactively sputtered Ti-Si-N films I. Physical properties
Sun, X., Reid, J. S., Kolawa, E., Nicolet, M.-A.
Published in Journal of applied physics (15.01.1997)
Published in Journal of applied physics (15.01.1997)
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Tantalum-based diffusion barriers in Si/Cu VLSi metallizations
KOLAWA, E, CHEN, J. S, REID, J. S, POKELA, P. J, NICOLET, M.-A
Published in Journal of applied physics (01.08.1991)
Published in Journal of applied physics (01.08.1991)
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Amorphous (Mo, Ta, or W)–Si–N diffusion barriers for Al metallizations
Reid, J. S., Kolawa, E., Garland, C. M., Nicolet, M.-A., Cardone, F., Gupta, D., Ruiz, R. P.
Published in Journal of applied physics (15.01.1996)
Published in Journal of applied physics (15.01.1996)
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Journal Article
Investigation of the Four-Gate Action in $hbox G^4$ -FETs
Dufrene, B., Akarvardar, K., Cristoloveanu, S., Blalock, B.J., Gentil, P., Kolawa, E., Mojarradi, M.M.
Published in IEEE transactions on electron devices (01.11.2004)
Published in IEEE transactions on electron devices (01.11.2004)
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Journal Article
Reactively sputtered Ti-Si-N films. II. Diffusion barriers for Al and Cu metallizations on Si
Sun, X., Reid, J. S., Kolawa, E., Nicolet, M.-A., Ruiz, R. P.
Published in Journal of applied physics (15.01.1997)
Published in Journal of applied physics (15.01.1997)
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Journal Article
Back-gate and series resistance effects in LDMOSFETs on SOI
Vandooren, A., Cristoloveanu, S., Mojarradi, M., Kolawa, E.
Published in IEEE transactions on electron devices (01.10.2001)
Published in IEEE transactions on electron devices (01.10.2001)
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Journal Article
A systematic investigation of the degradation mechanisms in SOI n-channel LD-MOSFETs
Vandooren, A., Cristoloveanu, S., Conley, J.F., Mojarradi, M., Kolawa, E.
Published in Solid-state electronics (01.09.2003)
Published in Solid-state electronics (01.09.2003)
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Journal Article
Ti-Si-N diffusion barriers between silicon and copper
Reid, J.S., Sun, X., Kolawa, E., Nicolet, M.-A.
Published in IEEE electron device letters (01.08.1994)
Published in IEEE electron device letters (01.08.1994)
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Journal Article
Films of Ni-7 at% V, Pd, Pt and Ta-Si-N as diffusion barriers for copper on Bi2Te3
KACSICH, T, KOLAWA, E, FIEURIAL, J. P, CAILLAT, T, NICOLET, M.-A
Published in Journal of physics. D, Applied physics (07.10.1998)
Published in Journal of physics. D, Applied physics (07.10.1998)
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Journal Article
Effect of Si in reactively sputtered Ti-Si-N films on structure and diffusion barrier performance
SUN, X, KOLAWA, E, IM, S, GARLAND, C, NICOLET, M.-A
Published in Applied physics. A, Materials science & processing (01.07.1997)
Published in Applied physics. A, Materials science & processing (01.07.1997)
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Journal Article
Instability of amorphous Ru-Si-O thin films under thermal oxidation
GASSER, S. M, RUIZ, R, KOLAWA, E, NICOLET, M.-A
Published in Journal of the Electrochemical Society (01.04.1999)
Published in Journal of the Electrochemical Society (01.04.1999)
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Journal Article
Performance of W100−xNx diffusion barriers between 〈Si〉 and Cu
Pokela, P.J., Kwok, C.-K., Kolawa, E., Raud, S., Nicolet, M.-A.
Published in Applied surface science (01.11.1991)
Published in Applied surface science (01.11.1991)
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Journal Article
Degradation mechanisms in SOI n-channel LDMOSFETs
Vandooren, A, Conley, J.F, Cristoloveanu, S, Mojarradi, M, Kolawa, E
Published in Microelectronic engineering (01.11.2001)
Published in Microelectronic engineering (01.11.2001)
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Journal Article
Conference Proceeding
Films of Ni-7 at% V, Pd, Pt and Ta-Si-N as diffusion barriers for copper on
Kacsich, T, Kolawa, E, Fleurial, J P, Caillat, T, Nicolet, M-A
Published in Journal of physics. D, Applied physics (07.10.1998)
Published in Journal of physics. D, Applied physics (07.10.1998)
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Journal Article
Amorphous Ta-Si-N diffusion barriers in Si/Al and Si/Cu metallizations
Kolawa, E., Pokela, P.J., Reid, J.S., Chen, J.S., Nicolet, M.-A.
Published in Applied surface science (01.11.1991)
Published in Applied surface science (01.11.1991)
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Journal Article
Conference Proceeding