CLEANING SOLUTION FOR SILICON GERMANIUM LAYER AND CLEANING METHOD USING THE SAME
KWON, DOO WON, KO, HYUNG HO, HONG, CHANG KI, MUN, CHANG SUP, CHOI, SANG JUN
Year of Publication 20.10.2005
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Year of Publication 20.10.2005
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METHOD OF MANUFACTURING SHALLOW TRENCH ISOLATION WITH HF VAPOR ETCHING PROCESS
KO, HYUNG HO, HONG, CHANG KI, KIM, YU KYUNG, SHIM, WOO GWAN, CHOI, SANG JUN
Year of Publication 13.06.2005
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Year of Publication 13.06.2005
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Method of manufacturing shallow trench isolation structure using HF vapor etching process
CHOI SANG-JUN, SHIM WOO-GWAN, KIM YU-KYUNG, KO HYUNG-HO, HONG CHANG-KI
Year of Publication 07.04.2005
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Year of Publication 07.04.2005
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Removing photoresist from substrate involves treating photoresist with supercritical carbon dioxide, treating photoresist with ozone-based reactant and removing the photoresist with deionized water
HAN, DONG-GYUN, CHOI, SANG-JUN, HONG, CHANG-KI, HAN, WOO-SUNG, LEE, HYO-SAN, KO, HYUNG-HO
Year of Publication 24.02.2005
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Year of Publication 24.02.2005
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WET PROCESS FOR SEMICONDUCTOR DEVICE FABRICATION USING ANODE WATER CONTAINING OXIDATIVE SUBSTANCES AND CATHODE WATER CONTAINING REDUCTIVE SUBSTANCES, AND ANODE WATER AND CATHODE WATER USED IN THE WET PROCESS
KWON YOUNG-MIN, HAH SANG-ROK, SHIM WOO-GWAN, PARK IM-SOO, LEE KUN-TACK, KO HYUNG-HO
Year of Publication 20.05.2003
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Year of Publication 20.05.2003
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WET PROCESS IN MANUFACTURING SEMICONDUCTOR ELEMENT USING ANODIC WATER CONTAINING OXIDATIVE MATERIAL AND/OR CATHODIC WATER CONTAINING REDUCING MATERIAL AND ANODIC WATER AND/OR CATHODIC WATER USED IN THIS PROCESS
RI KONTAKU, BOKU JINSHU, KA SHOROKU, SHIM WOO-GWAN, KO HYUNG-HO, KEN EIBIN
Year of Publication 22.05.2002
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Year of Publication 22.05.2002
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Wet process for semiconductor device fabrication using anode water containing oxidative substances and cathode water containing reductive substances, and anode water and cathode water used in the wet process
KWON YOUNG-MIN, HAH SANG-ROK, SHIM WOO-GWAN, PARK IM-SOO, LEE KUN-TACK, KO HYUNG-HO
Year of Publication 07.03.2002
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Year of Publication 07.03.2002
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A PHOTOMASK AND METHODS OF MANUFACTURING THE PHOTOMASK
KO, HYUNG HO, KIM, BYUNG GOOK, CHOI, JAE HYUCK, OH, JONG KEUN, CHOI, JUN YOUL
Year of Publication 13.01.2015
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Year of Publication 13.01.2015
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PHOTOMASK AND METHOD OF FORMING THE SAME
KO, HYUNG HO, SHIN, IN KYUN, CHOI, JAE HYUCK, OH, JONG KEUN, CHOI, JUN YOUL
Year of Publication 30.04.2014
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Year of Publication 30.04.2014
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SEMICONDUCTOR DEVICE HAVING SUB WORD LINE DRIVER
KWON, HYUK JOON, KO, HYUNG HO, PARK, WON KYUNG, YAMADA SATORU, CHAE, KYO SUK
Year of Publication 20.07.2011
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Year of Publication 20.07.2011
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A PHOTOMASK AND METHODS OF MANUFACTURING THE PHOTOMASK
KANG, DAE HYUK, KO, HYUNG HO, HAN, SUNG JAE, OH, JONG KEUN, JEON, CHAN UK, KIM, JUNG JIN
Year of Publication 20.07.2012
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Year of Publication 20.07.2012
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METHOD AND APPARATUS OF CLEANING PHOTOMASK BY BLOWING
KO, HYUNG HO, JEONG, YUN SONG, HAN, SUNG JAE, KIM, KYUNG NOH, JEON, CHAN UK
Year of Publication 10.02.2011
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Year of Publication 10.02.2011
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