Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
Faraz, Tahsin, Knoops, Harm C. M, Verheijen, Marcel A, van Helvoirt, Cristian A. A, Karwal, Saurabh, Sharma, Akhil, Beladiya, Vivek, Szeghalmi, Adriana, Hausmann, Dennis M, Henri, Jon, Creatore, Mariadriana, Kessels, Wilhelmus M. M
Published in ACS applied materials & interfaces (18.04.2018)
Published in ACS applied materials & interfaces (18.04.2018)
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Journal Article
Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
Arts, Karsten, Thepass, Harvey, Verheijen, Marcel A, Puurunen, Riikka L, Kessels, Wilhelmus M. M, Knoops, Harm C. M
Published in Chemistry of materials (13.07.2021)
Published in Chemistry of materials (13.07.2021)
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Journal Article
Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
Arts, Karsten, Utriainen, Mikko, Puurunen, Riikka L, Kessels, Wilhelmus M. M, Knoops, Harm C. M
Published in Journal of physical chemistry. C (07.11.2019)
Published in Journal of physical chemistry. C (07.11.2019)
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Journal Article
Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
Karwal, Saurabh, Karasulu, Bora, Knoops, Harm C.M, Vandalon, Vincent, Kessels, Wilhelmus M.M, Creatore, Mariadriana
Published in Nanoscale (14.06.2021)
Published in Nanoscale (14.06.2021)
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Journal Article
Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
Andringa, Anne-Marije, Perrotta, Alberto, de Peuter, Koen, Knoops, Harm C. M, Kessels, Wilhelmus M. M, Creatore, Mariadriana
Published in ACS applied materials & interfaces (14.10.2015)
Published in ACS applied materials & interfaces (14.10.2015)
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Journal Article
Surface zeta potential and diamond growth on gallium oxide single crystal
Mandal, Soumen, Arts, Karsten, Knoops, Harm C.M., Cuenca, Jerome A., Klemencic, Georgina M., Williams, Oliver A.
Published in Carbon (New York) (30.08.2021)
Published in Carbon (New York) (30.08.2021)
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Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Sharma, Akhil, Verheijen, Marcel A, Wu, Longfei, Karwal, Saurabh, Vandalon, Vincent, Knoops, Harm C M, Sundaram, Ravi S, Hofmann, Jan P, W M M (Erwin) Kessels, Bol, Ageeth A
Published in Nanoscale (14.05.2018)
Published in Nanoscale (14.05.2018)
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Journal Article
Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
Knoops, Harm C. M, Braeken, Eline M. J, de Peuter, Koen, Potts, Stephen E, Haukka, Suvi, Pore, Viljami, Kessels, Wilhelmus M. M
Published in ACS applied materials & interfaces (09.09.2015)
Published in ACS applied materials & interfaces (09.09.2015)
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Journal Article
Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
Faraz, Tahsin, van Drunen, Maarten, Knoops, Harm C. M, Mallikarjunan, Anupama, Buchanan, Iain, Hausmann, Dennis M, Henri, Jon, Kessels, Wilhelmus M. M
Published in ACS applied materials & interfaces (18.01.2017)
Published in ACS applied materials & interfaces (18.01.2017)
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Journal Article
Room-Temperature Atomic Layer Deposition of Platinum
Mackus, Adriaan J. M, Garcia-Alonso, Diana, Knoops, Harm C. M, Bol, Ageeth A, Kessels, Wilhelmus M. M
Published in Chemistry of materials (14.05.2013)
Published in Chemistry of materials (14.05.2013)
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Journal Article
Ultrathin superconducting TaCxN1−x films prepared by plasma-enhanced atomic layer deposition with ion-energy control
Peeters, Silke A., Lennon, Ciaran T., Merkx, Marc J. M., Hadfield, Robert H., Kessels, W. M. M. (Erwin), Verheijen, Marcel A., Knoops, Harm C. M.
Published in Applied physics letters (25.09.2023)
Published in Applied physics letters (25.09.2023)
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Journal Article
Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
Bosch, Roger H. E. C, Cornelissen, Lidewij E, Knoops, Harm C. M, Kessels, Wilhelmus M. M
Published in Chemistry of materials (23.08.2016)
Published in Chemistry of materials (23.08.2016)
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